SCHEMBL413732

SCHEMBL413732

CCC(CC)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2168494 0.83
SCHEMBL7172071 0.81
SCHEMBL10401373 0.81
SCHEMBL704115 0.81
SCHEMBL27974566 0.78
SCHEMBL16496985 0.78
SCHEMBL29086736 0.78
SCHEMBL27626696 0.76 TRPM8 (0.30)
SCHEMBL27646945 0.76
SCHEMBL3481722 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 426 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119119950-A Adhesion promoters for composite materials and methods thereof 波音公司 2024-12-13 CN claimed
CN-111482199-B Olefin cracking catalyst, preparation method thereof and olefin cracking method 中国石油大学(北京) 2023-12-15 CN claimed
US-20210354518-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2021-11-18 US claimed
CN-111482199-A Olefin cracking catalyst, preparation method thereof and olefin cracking method 中国石油大学(北京) 2020-08-04 CN claimed
EP-3315319-B1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO LTD (KR) 2020-06-24 EP claimed
CN-107972418-B Cavity noise reduction tire 韩国轮胎株式会社 2020-04-07 CN claimed
CN-109134720-A External electron donor for olefinic polymerization 印度石油有限公司 2019-01-04 CN claimed
US-10032788-B2 Semiconductor memory device TOSHIBA MEMORY CORPORATION (JP) 2018-07-24 US claimed
EP-3315319-A1 TIRE WITH REDUCED CAVITY NOISE Hankook Tire Co., Ltd. (KR) 2018-05-02 EP claimed
US-20180111428-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2018-04-26 US claimed
US-20060202311-A1 LOW k DIELECTRIC CVD FILM FORMATION PROCESS WITH IN-SITU IMBEDDED NANOLAYERS TO IMPROVE MECHANICAL PROPERTIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-09-14 US claimed
WO-2006088881-A2 ADVANCED LOW DIELECTRIC CONSTANT ORGANOSILICON PLASMA CHEMICAL VAPOR DEPOSITION FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-08-24 WO claimed
US-20060183345-A1 ADVANCED LOW DIELECTRIC CONSTANT ORGANOSILICON PLASMA CHEMICAL VAPOR DEPOSITION FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-08-17 US claimed
WO-2006022856-A2 DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-03-02 WO claimed
US-20060040513-A1 DUV laser annealing and stabilization of SiCOH films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-02-23 US claimed
US-6410770-B2 REDUCTION OF ALKOXYSILANE IN PRESENCE OF ALKALI METAL HYDRIDE AND HIGH BOILING SOLVENTS GELEST, INC. 2002-06-25 US claimed
US-20020002299-A1 Chloride-free process for the production of alkylsilanes suitable for microelectronic applications GELEST, INC. 2002-01-03 US claimed
WO-2001058908-A2 CHLORIDE-FREE PROCESS FOR THE PRODUCTION OF ALKYLSILANES SUITABLE FOR MICROELECTRONIC APPLICATIONS GELEST, INC. (US) 2001-08-16 WO claimed
EP-0045523-B1 ALPHA-SUBSTITUTED UREIDOBENZYLPENICILLANIC ACID DERIVATIVES AND PROCESS FOR PRODUCING THE SAME Chugai Seiyaku Kabushiki Kaisha (JP) 1984-12-05 EP claimed
EP-0045523-A1 Alpha-substituted ureidobenzylpenicillanic acid derivatives and process for producing the same Chugai Seiyaku Kabushiki Kaisha (JP) 1982-02-10 EP claimed