SCHEMBL14588703

SCHEMBL14588703

COc1cc(NC(=O)c2ccccc2)c(Cl)cc1[N+]#N

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.56
▸ KMT2A Q03164 3/20 0.56
▸ MAPT P10636 4/20 0.56
▸ LMNA P02545 2/20 0.56
▸ ALDH1A1 P00352 6/20 0.55
▸ SMN1; SMN2 Q16637 4/20 0.55
▸ KDM4E B2RXH2 5/20 0.54
▸ MAPK1 P28482 2/20 0.54
▸ HSD17B10 Q99714 1/20 0.54
▸ AHR P35869 1/20 0.53
▸ L3MBTL1 Q9Y468 1/20 0.53
▸ CYP1A2 P05177 1/20 0.52
▸ CYP2C9 P11712 1/20 0.52
▸ CYP2C19 P33261 1/20 0.52
▸ NPSR1 Q6W5P4 1/20 0.51
▸ HPGD P15428 3/20 0.51
▸ SMO Q99835 1/20 0.51
▸ NPY1R P25929 1/20 0.50
▸ NPY2R P49146 1/20 0.50
▸ RAB9A P51151 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10973722 0.88 MEN1 (0.68) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
Hydrochloric Acid SCHEMBL4608764 0.87 MEN1 (0.67) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL11690434 0.86 MEN1 (0.62) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL9653899 0.86 MEN1 (0.58) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
Zinc Chloride SCHEMBL30135274 0.85 MEN1 (0.61) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL11081067 0.85 MEN1 (0.60) MEN1KMT2AMAPTLMNAALDH1A1
Hydrochloric Acid SCHEMBL11693570 0.85 MEN1 (0.63) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL11427553 0.84 MEN1 (0.53) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL1258663 0.83 POLB (0.51) MEN1KMT2AMAPTLMNASMN1; SMN2
Hydrochloric Acid SCHEMBL1003649 0.82 CYP1A2 (0.50) MEN1KMT2AMAPTLMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 — — US disclosed
Send feedback