SCHEMBL14593298

SCHEMBL14593298

OC(c1ccc2c(C(O)(C(F)(F)F)C(F)(F)F)cccc2c1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.46
▸ KMT2A Q03164 3/20 0.46
▸ HSD17B10 Q99714 2/20 0.46
▸ KDM4E B2RXH2 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ MAPK1 P28482 2/20 0.46
▸ ALDH1A1 P00352 1/20 0.46
▸ GLA P06280 1/20 0.46
▸ POLB P06746 1/20 0.46
▸ GAA P10253 1/20 0.46
▸ HPGD P15428 1/20 0.46
▸ ATM Q13315 1/20 0.46
▸ ALOX15 P16050 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ AR P10275 1/20 0.42
▸ KCNJ11 Q14654 10/20 0.42
▸ PTPRC P08575 1/20 0.41
▸ ABCC9 O60706 3/20 0.40
▸ ABCC8 Q09428 3/20 0.40
▸ KCNJ8 Q15842 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12128501 0.80 MEN1 (0.64) MEN1KMT2AHSD17B10KDM4EMAPT
SCHEMBL3885735 0.80 KDM4E (0.68) MEN1KMT2AHSD17B10KDM4EMAPT
SCHEMBL7255062 0.80 PTPN1 (0.56) MEN1KMT2AHSD17B10KDM4EMAPT
SCHEMBL6816283 0.79 NR1H2 (0.50) MEN1KMT2AHSD17B10MAPK1ALOX15
SCHEMBL6816385 0.75 AR (0.47) MEN1KMT2AHSD17B10MAPK1ALOX15
SCHEMBL14593292 0.75 KDM4E (0.57) MEN1KMT2AHSD17B10KDM4EMAPT
SCHEMBL832913 0.72 NR1H3 (0.47) MEN1KMT2AHSD17B10MAPK1ALOX15
SCHEMBL548354 0.71 PTPRC (0.33) TSHRPTPRCPGR
SCHEMBL12126507 0.69 MEN1 (0.57) MEN1KMT2AHSD17B10KDM4EMAPT
SCHEMBL24719100 0.68 MEN1 (0.58) MEN1KMT2AHSD17B10MAPK1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 — — US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 — — US disclosed
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