Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.68 |
| ▸ | MEN1 | O00255 | 2/20 | 0.68 |
| ▸ | MAPT | P10636 | 2/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.68 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.68 |
| ▸ | GLA | P06280 | 1/20 | 0.68 |
| ▸ | POLB | P06746 | 1/20 | 0.68 |
| ▸ | GAA | P10253 | 1/20 | 0.68 |
| ▸ | HPGD | P15428 | 1/20 | 0.68 |
| ▸ | ATM | Q13315 | 1/20 | 0.68 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.68 |
| ▸ | KCNJ11 | Q14654 | 18/20 | 0.57 |
| ▸ | ABCC9 | O60706 | 9/20 | 0.57 |
| ▸ | ABCC8 | Q09428 | 9/20 | 0.57 |
| ▸ | KCNJ8 | Q15842 | 9/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14593292 | 0.87 | KDM4E (0.57) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL8376253 | 0.83 | HSD17B10 (0.47) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL589730 | 0.82 | HPGD (0.67) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL14593291 | 0.82 | KDM4E (0.66) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL3885737 | 0.82 | KDM4E (0.47) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL7258624 | 0.81 | KDM4E (1.00) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL5566472 | 0.81 | KDM4E (1.00) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL14703304 | 0.80 | KCNJ11 (0.46) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL14593298 | 0.80 | MEN1 (0.46) | KDM4EMEN1MAPTKMT2AALDH1A1 | |
| SCHEMBL2582219 | 0.79 | MEN1 (0.52) | KDM4EMEN1MAPTKMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| CN-101427181-A | Wet developable bottom antireflective coating composition and method of use | IBM (US) | 2009-05-06 | — | — | CN | claimed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | claimed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | claimed |
| US-9040225-B2 | Developable bottom antireflective coating composition and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-05-26 | — | — | US | disclosed |
| US-8999624-B2 | Developable bottom antireflective coating composition and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-04-07 | — | — | US | disclosed |
| US-20150050601-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF | GLOBALFOUNDRIES U.S. INC. | 2015-02-19 | — | — | US | disclosed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | disclosed |
| US-20130040238-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | US | disclosed |
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| CN-101427181-B | Wet developable bottom antireflective coating composition and method of use | IBM | 2012-03-21 | — | — | CN | disclosed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | disclosed |
| US-7563563-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-21 | — | — | US | disclosed |
| CN-101427181-A | Wet developable bottom antireflective coating composition and method of use | IBM (US) | 2009-05-06 | — | — | CN | disclosed |
| EP-2013659-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | International Business Machines Corporation IBM (US) | 2009-01-14 | — | — | EP | disclosed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | disclosed |