Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14601995 | 0.88 | POLB (0.34) | POLBAPEX1RECQLBLMESR2 | |
| SCHEMBL14601996 | 0.85 | ALDH1A1 (0.32) | POLBAPEX1RECQLBLMESR2 | |
| SCHEMBL14602050 | 0.83 | — | — | |
| SCHEMBL14602109 | 0.80 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL14602104 | 0.79 | ALDH1A1 (0.34) | POLBAPEX1RECQLBLMESR2 | |
| SCHEMBL14602045 | 0.77 | POLB (0.35) | POLBAPEX1RECQLBLMESR2 | |
| SCHEMBL14601997 | 0.76 | ALDH1A1 (0.35) | POLBAPEX1RECQLBLMESR2 | |
| SCHEMBL14602063 | 0.75 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL14602103 | 0.74 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL14602105 | 0.74 | ALDH1A1 (0.33) | POLBAPEX1RECQLBLMESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |