⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15978093 | 0.74 | BCHE (0.39) | — | |
| SCHEMBL13829296 | 0.74 | BCHE (0.39) | — | |
| SCHEMBL14616260 | 0.74 | — | — | |
| SCHEMBL10447883 | 0.73 | — | — | |
| SCHEMBL14226145 | 0.73 | — | — | |
| SCHEMBL14616335 | 0.73 | — | — | |
| SCHEMBL14330382 | 0.71 | — | — | |
| SCHEMBL14226146 | 0.70 | SLCO1B1 (0.31) | — | |
| SCHEMBL18707685 | 0.70 | — | — | |
| SCHEMBL13563651 | 0.69 | CYP4F2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8999630-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8822136-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-20130108960-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130017492-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |