SCHEMBL14616631

SCHEMBL14616631

CCOC(C)OCC1C(COC(C)OCC)C2CC1C1C(CC)CC(CC)C21

nearest known ligand 0.40

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14295533 0.84 LMNA (0.48) LMNA
SCHEMBL14295548 0.79 LMNA (0.46) LMNA
SCHEMBL5353089 0.72 LMNA (0.46) LMNA
SCHEMBL14616625 0.63 LMNA (0.40) LMNA
SCHEMBL2094168 0.63 LMNA (1.00) LMNA
SCHEMBL9459 0.63
SCHEMBL18698676 0.62 LMNA (0.39) LMNA
Cyclopropane SCHEMBL1406305 0.61 LMNA (0.80) LMNA
SCHEMBL7847095 0.61 LMNA (0.80) LMNA
SCHEMBL5430527 0.61 LMNA (0.60) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20130017377-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-01-17 US disclosed