Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL78884 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL27883463 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL16059228 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL11137355 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL29289482 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL11137352 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| Sulfuric Acid SCHEMBL1334876 | 0.87 | NPSR1 (0.46) | TDP1NPSR1CHRM2CHRM4CHRM5 | |
| SCHEMBL14635335 | 0.86 | NPSR1 (0.35) | TSHRTDP1NPSR1ALDH1A1CYP2C9 | |
| SCHEMBL746207 | 0.84 | NPSR1 (0.40) | NPSR1CHRM2CHRM4CHRM5CHRM1 | |
| Sulfuric Acid SCHEMBL29666291 | 0.84 | NPSR1 (0.45) | NPSR1CHRM2CHRM4CHRM5CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111792630-B | Preparation method of lithium bis (fluorosulfonyl) imide | 临海市利民化工有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-113511639-B | Lithium bis (fluorosulfonyl) imide and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2023-03-14 | — | — | CN | disclosed |
| CN-111517293-B | Preparation method of bis-fluorosulfonyl imide compound and metal salt thereof | 中国科学院上海有机化学研究所 | 2023-01-31 | — | — | CN | disclosed |
| CN-110217764-B | Preparation method of organic alkali salt of bis (fluorosulfonyl) imide | 中国科学院上海有机化学研究所 | 2022-08-09 | — | — | CN | disclosed |
| CN-113511639-A | Lithium bis (fluorosulfonyl) imide and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2021-10-19 | — | — | CN | disclosed |
| CN-109071980-B | Ink composition, cured pattern formed therefrom, heating element including the cured pattern, and method of making the same | 株式会社LG化学 | 2021-09-21 | — | — | CN | disclosed |
| US-11026298-B2 | Ink composition, cured patterns produced thereby, heating element including same, and manufacturing method therefor | LG CHEM, LTD. (KR) | 2021-06-01 | — | — | US | disclosed |
| EP-3412737-B1 | INK COMPOSITION, CURED PATTERNS PRODUCED THEREBY, HEATING ELEMENT INCLUDING SAME, AND MANUFACTURING METHOD THEREFOR | LG CHEMICAL LTD (KR) | 2021-05-26 | — | — | EP | disclosed |
| CN-111792630-A | Preparation method of lithium bis (fluorosulfonyl) imide | 临海市利民化工有限公司 | 2020-10-20 | — | — | CN | disclosed |
| CN-111517293-A | Preparation method of bis-fluorosulfonyl imide compound and metal salt thereof | 中国科学院上海有机化学研究所 | 2020-08-11 | — | — | CN | disclosed |
| EP-2554530-B2 | METHOD FOR PRODUCING 3-CHLORO-PENTAFLUOROPROPENE | DAIKIN IND LTD (JP) | 2019-06-12 | — | — | EP | disclosed |
| US-20190098706-A1 | INK COMPOSITION, CURED PATTERNS PRODUCED THEREBY, HEATING ELEMENT INCLUDING SAME, AND MANUFACTURING METHOD THEREFOR | LG CHEM, LTD. (KR) | 2019-03-28 | — | — | US | disclosed |
| EP-3412737-A1 | INK COMPOSITION, CURED PATTERNS PRODUCED THEREBY, HEATING ELEMENT INCLUDING SAME, AND MANUFACTURING METHOD THEREFOR | LG Chem, Ltd. (KR) | 2018-12-12 | — | — | EP | disclosed |
| EP-2554530-B1 | METHOD FOR PRODUCING 3-CHLORO-PENTAFLUOROPROPENE | DAIKIN IND LTD (JP) | 2016-07-13 | — | — | EP | disclosed |
| CN-102834366-B | Method for producing 3-chloro-pentafluoropropene | DAIKIN IND LTD | 2015-03-18 | — | — | CN | disclosed |
| US-8816138-B2 | Method for producing 3-chloro-pentafluoropropene | DAIKIN INDUSTRIES, LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-2554530-A1 | METHOD FOR PRODUCING 3-CHLORO-PENTAFLUOROPROPENE | Daikin Industries, Ltd. (JP) | 2013-02-06 | — | — | EP | disclosed |
| US-20130023704-A1 | METHOD FOR PRODUCING 3-CHLORO-PENTAFLUOROPROPENE | DAIKIN INDUSTRIES, LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| CN-102834366-A | Method for producing 3-chloro-pentafluoropropene | DAIKIN IND LTD | 2012-12-19 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130023704-A1 | METHOD FOR PRODUCING 3-CHLORO-PENTAFLUOROPROPENE | PFAS, FFAR3, NOTUM | TSHR 238/4885TDP1 4475/4885NPSR1 742/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.