Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 3/20 | 0.42 |
| ▸ | CYP4A11 | Q02928 | 3/20 | 0.42 |
| ▸ | CES2 | O00748 | 2/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.31 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.31 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | ACHE | P22303 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15275117 | 0.88 | CYP4F2 (0.45) | CYP4F2CYP4A11CES2NAAAHTT | |
| SCHEMBL15432458 | 0.87 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL13667082 | 0.87 | CYP4F2 (0.42) | CYP4F2CYP4A11NAAAALDH1A1FKBP1A | |
| SCHEMBL25667373 | 0.85 | CYP4F2 (0.37) | CYP4F2CYP4A11CES2NAAAALDH1A1 | |
| SCHEMBL13667073 | 0.85 | CYP4F2 (0.46) | CYP4F2CYP4A11NAAAALDH1A1EPHX1 | |
| SCHEMBL25784398 | 0.83 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL10189201 | 0.83 | CYP4F2 (0.35) | CYP4F2CYP4A11NAAA | |
| SCHEMBL16214004 | 0.83 | CYP4F2 (0.38) | CYP4F2CYP4A11CES2NAAATHRB | |
| SCHEMBL17552832 | 0.82 | CYP4F2 (0.41) | CYP4F2CYP4A11CES2NAAAHTT | |
| SCHEMBL2754863 | 0.82 | CYP4F2 (0.46) | CYP4F2CYP4A11NAAATHRBPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9411227-B2 | Resist composition, method of forming resist pattern, compound, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9354515-B2 | Resist composition, acid generator, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20150198881-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9057948-B2 | Resist composition for EUV or EB, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20150140497-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| US-8956801-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20150037734-A1 | RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8795948-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8778595-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130252180-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130224656-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130157201-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130143159-A1 | RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130071789-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130022911-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150198881-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND POLYMERIC COMPOUND | C9, SLC11A2, AR | CYP4F2 1573/4885CYP4A11 146/4885CES2 2037/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.