SCHEMBL14649751

SCHEMBL14649751

CCC(C)(C)C(=O)OCCCCOC(=O)c1ccc(OS(=O)(=O)C(CNCC(F)(F)F)C(F)(F)C(F)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 9/20 0.41
LMNA P02545 3/20 0.33
CYP1A2 P05177 2/20 0.33
TSHR P16473 2/20 0.33
CYP2C19 P33261 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
POLB P06746 1/20 0.33
ESR1 P03372 1/20 0.33
CYP2D6 P10635 1/20 0.33
MAPK1 P28482 1/20 0.33
NR1H2 P55055 1/20 0.33
RNASEL Q05823 1/20 0.33
HPGD P15428 1/20 0.33
RECQL P46063 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
PDE4D Q08499 1/20 0.33
ALDH1A1 P00352 3/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14330816 0.85 POLB (0.41) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL16436945 0.81 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL15216846 0.79 STS (0.43) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL14787905 0.75 STS (0.43) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL9963795 0.72 STS (0.49) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL14984062 0.71 STS (0.38) STSLMNASMN1; SMN2POLBHPGD
SCHEMBL16904907 0.71 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL16638156 0.71 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL2740702 0.68 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL2740703 0.67 STS (0.41) STSLMNACYP1A2TSHRCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778595-B2 Resist composition, method of forming resist pattern, and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-15 US disclosed
US-20130157201-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-06-20 US disclosed
US-20130022911-A1 POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-01-24 US disclosed