SCHEMBL15216846

SCHEMBL15216846

CCC(C)(C)C(=O)OCCCCOC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)CNCC(F)(F)F)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STS P08842 9/20 0.43
LMNA P02545 3/20 0.35
CYP1A2 P05177 2/20 0.35
TSHR P16473 2/20 0.35
CYP2C19 P33261 2/20 0.35
ESR1 P03372 1/20 0.35
CYP2D6 P10635 1/20 0.35
MAPK1 P28482 1/20 0.35
NR1H2 P55055 1/20 0.35
RNASEL Q05823 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
POLB P06746 2/20 0.35
CYP3A4 P08684 1/20 0.34
CYP2C9 P11712 1/20 0.34
PDE4D Q08499 1/20 0.34
HPGD P15428 1/20 0.34
RECQL P46063 1/20 0.34
ALDH1A1 P00352 2/20 0.33
MAPT P10636 2/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14787905 0.86 STS (0.43) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL16904907 0.84 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL9963795 0.84 STS (0.49) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL16638156 0.82 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL2740702 0.80 STS (0.44) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL14649751 0.79 STS (0.41) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL2740703 0.78 STS (0.41) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL16376095 0.77 STS (0.39) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL17409182 0.75 STS (0.39) STSLMNACYP1A2TSHRCYP2C19
SCHEMBL14984062 0.73 STS (0.38) STSLMNASMN1; SMN2POLBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057948-B2 Resist composition for EUV or EB, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-06-16 US disclosed
US-8956801-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-02-17 US disclosed
US-20130224656-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-08-29 US disclosed