⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14701505 | 0.89 | — | — | |
| SCHEMBL14700451 | 0.88 | — | — | |
| SCHEMBL14701488 | 0.84 | PKM (0.35) | — | |
| SCHEMBL14701406 | 0.83 | — | — | |
| SCHEMBL14701405 | 0.80 | CYP17A1 (0.35) | — | |
| SCHEMBL14700456 | 0.77 | — | — | |
| SCHEMBL14700443 | 0.74 | PKM (0.35) | — | |
| SCHEMBL14701493 | 0.74 | PKM (0.36) | — | |
| SCHEMBL14731107 | 0.71 | — | — | |
| SCHEMBL14701501 | 0.70 | PKM (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802352-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |