SCHEMBL1470176

SCHEMBL1470176

O=S(=O)(O)c1cc(Cl)cc(N=Nc2c(S(=O)(=O)O)cc3cc(S(=O)(=O)O)c(N=Nc4cc(Cl)cc(S(=O)(=O)O)c4O)c(O)c3c2O)c1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NSD2 O96028 1/20 0.58
▸ MMP14 P50281 1/20 0.58
▸ CASP6 P55212 1/20 0.58
▸ PRMT1 Q99873 1/20 0.55
▸ CYP1A2 P05177 4/20 0.48
▸ CYP2C9 P11712 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ DNASE1L3 Q13609 1/20 0.47
▸ MEN1 O00255 3/20 0.46
▸ KMT2A Q03164 3/20 0.46
▸ POLB P06746 1/20 0.46
▸ GRK2 P25098 1/20 0.46
▸ PLEC Q15149 1/20 0.46
▸ HTT P42858 1/20 0.46
▸ ENPP2 Q13822 4/20 0.43
▸ FUT8 Q9BYC5 1/20 0.43
▸ PHLPP2 Q6ZVD8 2/20 0.41
▸ ALDH1A1 P00352 3/20 0.39
▸ HIF1A Q16665 2/20 0.39
▸ THRB P10828 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31568904 1.00 NSD2 (0.58) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL11230644 1.00 NSD2 (0.58) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL8756353 0.99 NSD2 (0.56) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL8756383 0.99 PRMT1 (0.57) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL8756368 0.84 MEN1 (0.61) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL10536238 0.80 PHLPP2 (0.55) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL10536224 0.80 PHLPP2 (0.55) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL1472399 0.77 CYP1A2 (0.62) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL1472408 0.77 CYP1A2 (0.62) NSD2MMP14CASP6PRMT1CYP1A2
SCHEMBL8756476 0.77 PRMT1 (0.52) NSD2MMP14CASP6PRMT1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4613706-A1 CARBON NANOTUBE DISPERSION AND METHOD FOR PREPARING SAME LG CHEM, LTD. (KR) 2025-09-10 — — EP disclosed
EP-3965738-B1 METHOD FOR PRODUCTION OF LIPOSOMES UNIV DO MINHO (PT) 2025-08-06 — — EP disclosed
WO-2025029048-A1 CARBON NANOTUBE DISPERSION AND METHOD FOR PREPARING SAME 주식회사 엘지화학 2025-02-06 — — WO disclosed
US-20220241203-A1 METHOD FOR PRODUCTION OF LIPOSOMES UNIVERSIDADE DO MINHO (PT) 2022-08-04 — — US disclosed
US-8294282-B2 Semiconductor device and adhesive sheet KABUSHIKI KAISHA TOSHIBA (JP) 2012-10-23 — — US disclosed
US-20110068480-A1 SEMICONDUCTOR DEVICE AND ADHESIVE SHEET TOSHIBA MEMORY CORPORATION (JP) 2011-03-24 — — US disclosed
US-6498132-B2 SURFACE TREATMENT COMPOSITION COMPRISES A COMPLEXING AGENT AS A METAL DEPOSITION PREVENTIVE COMPRISING ATLEAST ONE AROMATIC HYDROCARBON RING CONTAINING HYDROXY OR O-GROUP DIRECTLY ATTACHED WITH RING CARBON AND A SECOND COMPLEXING AGENT MITSUBISHI CHEMICAL CORPORATION (JP) 2002-12-24 — — US disclosed
US-20020045556-A1 Method for treating surface of substrate and surface treatment composition used for the same MITSUBISHI CHEMICAL CORPORATION (JP) 2002-04-18 — — US disclosed
US-5885362-A APPLYING TO SURFACE A COMPOSITION COMPRISING A LIQUID MEDIUM AND AT LEAST ONE COMPLEXING AGENT, FOR EXAMPLE ETHYLENEDIAMINEDIORTHOHYDROXYPHENYLACETIC ACID MITSUBISHI CHEMICAL CORPORATION (JP) 1999-03-23 — — US disclosed
US-5790627-A Method and apparatus for observing a specimen using an X-ray microscope RESEARCH DEVELOPMENT CORP. (JP) 1998-08-04 — — US disclosed
EP-0789071-A1 METHOD FOR TREATING SURFACE OF SUBSTRATE AND SURFACE TREATMENT COMPOSITION THEREFOR MITSUBISHI CHEMICAL CORPORATION (JP) 1997-08-13 — — EP disclosed
US-4361842-A INK JET CANON KABUSHIKI KAISHA (JP) 1982-11-30 — — US disclosed
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