Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14701761 | 0.89 | CYP19A1 (0.39) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL14703968 | 0.88 | TSHR (0.42) | TSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL14701767 | 0.86 | TSHR (0.48) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL14701766 | 0.85 | CYP17A1 (0.33) | TSHRNPSR1CYP17A1CYP19A1 | |
| SCHEMBL14701795 | 0.81 | TSHR (0.50) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL14703973 | 0.81 | TSHR (0.44) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL26061863 | 0.80 | TSHR (0.51) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL685848 | 0.80 | TSHR (0.51) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL685366 | 0.80 | TSHR (0.53) | TSHRNPSR1CYP17A1CYP19A1EPHX2 | |
| SCHEMBL685847 | 0.80 | TSHR (0.53) | TSHRNPSR1CYP17A1CYP19A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9051251-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20130040237-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130040237-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | F12, C1S, FRG1 | TSHR 1234/4885NPSR1 225/4885CYP17A1 2059/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.