Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 4/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.39 |
| ▸ | PDE4D | Q08499 | 5/20 | 0.38 |
| ▸ | GPR55 | Q9Y2T6 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.37 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | TYMS | P04818 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29646298 | 1.00 | ESR1 (0.47) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL29703311 | 0.78 | ESR1 (0.54) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL14740013 | 0.78 | ESR1 (0.54) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL649109 | 0.77 | PDE4D (0.53) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL20941952 | 0.77 | ESR1 (0.45) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL29462973 | 0.77 | PDE4D (0.53) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL28529209 | 0.77 | ESR1 (0.57) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL5678731 | 0.76 | MEN1 (0.50) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL900116 | 0.76 | MEN1 (0.63) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL45826 | 0.76 | MEN1 (0.63) | ESR1ESR2MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115963695-A | Organic film forming material, pattern forming method, and compound | 信越化学工业株式会社 | 2023-04-14 | — | — | CN | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8652756-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130056654-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |