SCHEMBL14754154

SCHEMBL14754154

CC[N+](C)(C)CCCC[N+](C)(C)CC

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 8/20 0.77
KMT2A Q03164 3/20 0.77
HTT P42858 2/20 0.77
HSP90AA1 P07900 2/20 0.72
RAD52 P43351 2/20 0.72
BBOX1 O75936 3/20 0.52
PLA2G1B P04054 1/20 0.43
ATG4B Q9Y4P1 1/20 0.43
MEN1 O00255 2/20 0.41
NFKB1 P19838 2/20 0.41
KDM4E B2RXH2 1/20 0.41
LMNA P02545 1/20 0.41
ACHE P22303 1/20 0.41
APEX1 P27695 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HRH3 Q9Y5N1 1/20 0.41
TSHR P16473 1/20 0.41
RAB9A P51151 1/20 0.41
PMP22 Q01453 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30019055 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL29548167 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL14742997 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL14754249 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL13567362 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL29548125 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL29548168 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL13664374 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL14754178 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52
SCHEMBL30019681 0.96 DNM1 (0.82) DNM1KMT2AHTTHSP90AA1RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US disclosed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US disclosed
CN-114258421-A Chemical mechanical polishing composition, cleaning composition, chemical mechanical polishing method and cleaning method CMC材料株式会社 2022-03-29 CN disclosed
US-20170162898-A1 Quaternary Ammonium Halides With Ether Functional Groups For Use As Battery Electrolytes ALBEMARLE AMENDMENTS, LLC 2017-06-08 US disclosed
EP-2751308-B1 PROCESS FOR CATHODIC DEOXYGENATION OF AMIDES AND ESTERS Johannes Gutenberg-Universität Mainz (DE) 2017-03-22 EP disclosed
WO-2013030316-A2 PROCESS FOR CATHODIC DEOXYGENATION OF AMIDES AND ESTERS Johannes Gutenberg-Universität Mainz (DE) 2013-03-07 WO disclosed