Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1476357 | 1.00 | TSHR (0.33) | TSHRSHBG | |
| SCHEMBL3169039 | 0.85 | — | — | |
| SCHEMBL3169049 | 0.85 | — | — | |
| SCHEMBL5974059 | 0.79 | CA1 (0.40) | TSHR | |
| SCHEMBL5974432 | 0.79 | CA1 (0.35) | — | |
| SCHEMBL6686758 | 0.78 | TSHR (0.44) | TSHRSHBG | |
| SCHEMBL19970500 | 0.77 | — | — | |
| SCHEMBL19970502 | 0.77 | — | — | |
| SCHEMBL5974177 | 0.77 | CA1 (0.39) | — | |
| SCHEMBL3504356 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2813892-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2020-06-17 | — | — | EP | disclosed |
| US-10228621-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-12 | — | — | US | disclosed |
| US-10156788-B2 | Resist underlayer film composition, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| EP-2813890-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-9984878-B2 | Resist under layer film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9899218-B2 | Resist under layer film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-2813889-B1 | Photoresist underlayer film-forming composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-2813891-B1 | Photoresist underlayer film-forming composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-9620363-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20170018436-A1 | RESIST UNDERLAYER FILM COMPOSTION, PATTERNING PROCESS, AND COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-19 | — | — | US | disclosed |
| EP-2813889-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| EP-2813892-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| US-20140363956-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363958-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363957-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363955-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-7915524-B2 | Sealing agent for photoelectric conversion device and photoelectric conversion device using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20060162771-A1 | Sealing agent for photoelectric conversion element and photoelectric conversion device element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1598897-A1 | SEALING AGENT FOR PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTRIC CONVERSION ELEMENT USING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2005-11-23 | — | — | EP | disclosed |
| US-6210790-B1 | TRANSPARENCY, HARDNESS, ABRASION-RESISTANCE | RENSSELAER POLYTECHNIC INSTITUTE | 2001-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10156788-B2 | Resist underlayer film composition, patterning process, and compound | PARG, INTS9, PRDM9 | TSHR 4661/4885SHBG 2400/4885 |
| US-20170018436-A1 | RESIST UNDERLAYER FILM COMPOSTION, PATTERNING PROCESS, AND COMPOUND | PARG, INTS9, FRG1 | TSHR 4586/4885SHBG 1973/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.