Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMPD1 | P17405 | 3/20 | 0.41 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.33 |
| ▸ | ADH1B | P00325 | 1/20 | 0.33 |
| ▸ | ADH1C | P00326 | 1/20 | 0.33 |
| ▸ | ADH1A | P07327 | 1/20 | 0.33 |
| ▸ | ADH4 | P08319 | 1/20 | 0.33 |
| ▸ | ADH7 | P40394 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | DDAH1 | O94760 | 1/20 | 0.32 |
| ▸ | GAPDH | P04406 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | FDPS | P14324 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.31 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7205871 | 0.98 | SMPD1 (0.44) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL28331312 | 0.86 | SMPD1 (0.39) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL16107061 | 0.82 | SMPD1 (0.38) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL9255641 | 0.80 | SMPD1 (0.37) | SMPD1OPRM1LMNATRPA1DDAH1 | |
| SCHEMBL8069696 | 0.80 | FAAH (0.39) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL9255651 | 0.80 | SMPD1 (0.37) | SMPD1OPRM1LMNATRPA1DDAH1 | |
| SCHEMBL8069692 | 0.80 | FAAH (0.39) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL7208961 | 0.80 | TSHR (0.42) | SMPD1MAPTTSHRZDHHC7GPR84 | |
| SCHEMBL17288698 | 0.76 | SMPD1 (0.41) | SMPD1OPRM1LMNADNM1ADH1B | |
| SCHEMBL31220927 | 0.76 | SMPD1 (0.45) | SMPD1OPRM1LMNAADH1BADH1C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003031492-A1 | THERMALLY REWORKABLE EPOXY RESINS AND COMPOSITIONS BASED THEREO N | HENKEL CORPORATION (US) | 2003-04-17 | — | — | WO | claimed |
| EP-1002018-A2 | RADIATION CURABLE COMPOSITIONS | SARTOMER COMPANY INC. (US) | 2000-05-24 | — | — | EP | claimed |
| US-6030703-A | SUITABLE FOR FREE RADICAL, RADIATION CURABLE COATING | SARTOMER COMPANY, INC. (US) | 2000-02-29 | — | — | US | claimed |
| WO-1999006463-A2 | RADIATION CURABLE POLYESTER COMPOSITIONS | SARTOMER COMPANY, INC. (US) | 1999-02-11 | — | — | WO | claimed |
| WO-2021070491-A1 | PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING | サンアプロ株式会社 | 2021-04-15 | — | — | WO | disclosed |
| EP-2813892-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2020-06-17 | — | — | EP | disclosed |
| US-10228621-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-12 | — | — | US | disclosed |
| US-10156788-B2 | Resist underlayer film composition, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| EP-2813890-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-9984878-B2 | Resist under layer film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9899218-B2 | Resist under layer film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-2813889-B1 | Photoresist underlayer film-forming composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-20140363957-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-7915524-B2 | Sealing agent for photoelectric conversion device and photoelectric conversion device using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20060162771-A1 | Sealing agent for photoelectric conversion element and photoelectric conversion device element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1598897-A1 | SEALING AGENT FOR PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTRIC CONVERSION ELEMENT USING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2005-11-23 | — | — | EP | disclosed |
| WO-2003031492-A1 | THERMALLY REWORKABLE EPOXY RESINS AND COMPOSITIONS BASED THEREO N | HENKEL CORPORATION (US) | 2003-04-17 | — | — | WO | disclosed |
| EP-1002018-A2 | RADIATION CURABLE COMPOSITIONS | SARTOMER COMPANY INC. (US) | 2000-05-24 | — | — | EP | disclosed |
| US-6030703-A | SUITABLE FOR FREE RADICAL, RADIATION CURABLE COATING | SARTOMER COMPANY, INC. (US) | 2000-02-29 | — | — | US | disclosed |
| WO-1999006463-A2 | RADIATION CURABLE POLYESTER COMPOSITIONS | SARTOMER COMPANY, INC. (US) | 1999-02-11 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10156788-B2 | Resist underlayer film composition, patterning process, and compound | PARG, INTS9, PRDM9 | SMPD1 4704/4885OPRM1 4253/4885LMNA 483/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.