Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.36 |
| ▸ | GALR3 | O60755 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | PRKCA | P17252 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1897512 | 0.81 | TSHR (0.40) | TSHRALDH1A1 | |
| SCHEMBL20960007 | 0.79 | TSHR (0.37) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL7717746 | 0.78 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL1895713 | 0.77 | TSHR (0.40) | TSHRSMN1; SMN2ALDH1A1HSD17B10 | |
| SCHEMBL1607344 | 0.71 | TSHR (0.46) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL987906 | 0.71 | TSHR (0.65) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL12138626 | 0.71 | GAA (0.35) | GAA | |
| SCHEMBL300519 | 0.70 | ALDH1A1 (0.46) | TSHRALDH1A1TDP1 | |
| SCHEMBL7604409 | 0.70 | TSHR (0.44) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL6668901 | 0.70 | TDP1 (0.35) | TSHRCHRM1ALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022230690-A1 | INKJET INK, METHOD FOR PRODUCING PRINTED MATTER, PRINTED MATTER, AND METAL PIGMENT DISPERSION | ナトコ株式会社 | 2022-11-03 | — | — | WO | disclosed |
| CN-111532046-A | Shaped body | 世联株式会社 | 2020-08-14 | — | — | CN | disclosed |
| US-20200254801-A1 | FORMED BODY | SEIREN CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| CN-110709254-A | Printed matter and method for producing printed matter | 世联株式会社 | 2020-01-17 | — | — | CN | disclosed |
| EP-3498791-A1 | INK AND METHOD FOR PRODUCING PRINTED MATTER | Seiren Co., Ltd. (JP) | 2019-06-19 | — | — | EP | disclosed |
| US-20190177562-A1 | INK AND METHOD FOR PRODUCING PRINTED MATTER | SEIREN CO., LTD. (JP) | 2019-06-13 | — | — | US | disclosed |
| US-9188857-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20130252181-A1 | RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION, AND PROCESS FOR PRODUCTION OF SUBSTRATES WITH PATTERNS THEREON | MITSUBISHI RAYON CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-8476401-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-20080274305-A1 | Liquid Crystal Sealant and Liquid Crystal Display Cell Utilizing the Same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| US-20080032241-A1 | Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1780587-A1 | LIQUID CRYSTAL SEALANT AND LIQUID CRYSTAL DISPLAY CELL UTILIZING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-7101596-B2 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-09-05 | — | — | US | disclosed |
| US-20060162771-A1 | Sealing agent for photoelectric conversion element and photoelectric conversion device element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1674919-A1 | SEALANT FOR LIQUID CRYSTAL, LIQUID-CRYSTAL DISPLAY MADE WITH THE SAME, AND PROCESS FOR PRODUICNG THE DISPLAY | Nippon Kayaku Kabushiki Kaisha (JP) | 2006-06-28 | — | — | EP | disclosed |
| EP-1598897-A1 | SEALING AGENT FOR PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTRIC CONVERSION ELEMENT USING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2005-11-23 | — | — | EP | disclosed |
| US-20050181145-A1 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | SHARP KABUSHIKI KAISHA (JP) | 2005-08-18 | — | — | US | disclosed |
| US-6120858-A | COMPRISING AN EPOXY RESIN, A NOVOLAC RESIN, A CURING ACCELERATOR AND A TITANIUM BLACK PIGMENT | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2000-09-19 | — | — | US | disclosed |