⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30951771 | 0.91 | — | — | |
| SCHEMBL30951772 | 0.91 | — | — | |
| Potassium Ion SCHEMBL23113871 | 0.84 | — | — | |
| SCHEMBL31239070 | 0.84 | — | — | |
| SCHEMBL49560 | 0.80 | — | — | |
| SCHEMBL21951515 | 0.80 | — | — | |
| SCHEMBL21111529 | 0.80 | — | — | |
| SCHEMBL21951703 | 0.80 | — | — | |
| SCHEMBL20943732 | 0.80 | — | — | |
| SCHEMBL502686 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 611 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119911917-A | Method for preparing heteropolyacid by scheelite short process and flow battery application thereof | 中南大学 | 2025-05-02 | — | — | CN | claimed |
| CN-118878892-B | Durable proton exchange membrane and preparation method thereof | 江苏源氢新能源科技股份有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-119080659-A | Thiophanate-methyl synthesis process | 安徽广信农化股份有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-115255347-B | Tungsten silicate micrometer zero-valent iron material and preparation method and application thereof | 南昌大学 | 2024-08-09 | — | — | CN | claimed |
| CN-113922102-B | Composite wave-absorbing material and preparation method thereof | 西安工业大学 | 2024-06-21 | — | — | CN | claimed |
| CN-116120153-B | Method for preparing resorcinol by cracking dicumyl peroxide | 万华化学集团股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-113603574-B | Method for catalyzing catalytic oxidation reaction of cyclopentene by using short-site silicotungstic heteropolyacid salt catalyst | 广东新华粤石化集团股份公司 | 2023-11-10 | — | — | CN | claimed |
| CN-116888243-A | Integrated process for producing benzene, toluene and xylenes from a pyrolysis fuel oil stream with a dearomatization column | 沙特阿拉伯石油公司 | 2023-10-13 | — | — | CN | claimed |
| CN-116829680-A | Integrated process using deasphalting column for direct catalytic upgrading of crude oil | 沙特阿拉伯石油公司 | 2023-09-29 | — | — | CN | claimed |
| CN-116120153-A | Method for preparing resorcinol by cracking dicumyl peroxide | 万华化学集团股份有限公司 | 2023-05-16 | — | — | CN | claimed |
| US-20050101083-A1 | Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. | 2005-05-12 | — | — | US | claimed |
| US-6841441-B2 | Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 2005-01-11 | — | — | US | claimed |
| US-20040171177-A1 | Amorphous and polycrystalline silicon nanolaminate | GLOBALFOUNDRIES INC. (KY) | 2004-09-02 | — | — | US | claimed |
| US-20040129941-A1 | AMORPHOUS AND POLYCRYSTALLINE SILICON NANOLAMINATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-07-08 | — | — | US | claimed |
| US-20040132271-A1 | Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. | 2004-07-08 | — | — | US | claimed |
| US-5698461-A | Method for fabricating lightly doped drain metal oxide semiconductor field effect transistor | UNITED MICROELECTRONICS CORP. (TW) | 1997-12-16 | — | — | US | claimed |
| US-5576242-A | Method of forming self-aligned buried contact | UNITED MICROELECTRONICS CORP. (TW) | 1996-11-19 | — | — | US | claimed |
| US-5275713-A | Immersing rectifier metal in bath comprising water, hydrogen peroxide, hydrogen fluoride, molybdenum oxide, alkali metal silicate; imposing voltage potential | TECHNOLOGY APPLICATIONS GROUP, INC. | 1994-01-04 | — | — | US | claimed |
| EP-0469606-A2 | A process for forming a MES electrode | SUMITOMO ELECTRIC INDUSTRIES, LIMITED (JP) | 1992-02-05 | — | — | EP | claimed |
| US-4920908-A | Method and apparatus for deposition of tungsten silicides | GENUS, INC. (US) | 1990-05-01 | — | — | US | claimed |