⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL767556 | 0.84 | S1PR2 (0.68) | — | |
| SCHEMBL766904 | 0.84 | S1PR2 (0.68) | — | |
| SCHEMBL767878 | 0.84 | S1PR2 (0.68) | — | |
| SCHEMBL767663 | 0.84 | S1PR2 (0.68) | — | |
| SCHEMBL4966489 | 0.82 | TYMS (0.53) | — | |
| SCHEMBL5595395 | 0.81 | S1PR2 (0.59) | — | |
| SCHEMBL744518 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL5985877 | 0.79 | S1PR2 (0.57) | — | |
| SCHEMBL5595548 | 0.77 | S1PR2 (0.73) | — | |
| Diethylamine SCHEMBL11311124 | 0.77 | LPAR3 (0.62) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118202306-A | Method for producing printed wiring board, method for stripping resist, and resist stripping pretreatment liquid used for the methods | 三菱瓦斯化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-114736238-B | Protein carboxyl phosphorylation labeling reagent containing stable isotope, and preparation method and application thereof | 广东磷基生物科技有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-116234893-A | Chemical Mechanical Planarization (CMP) post-cleaning | 弗萨姆材料美国有限责任公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-114736238-A | Protein carboxyl phosphorylation labeling reagent containing stable isotope and preparation method and application thereof | 厦门大学 | 2022-07-12 | — | — | CN | disclosed |
| US-9726978-B2 | Cleaning composition, cleaning process, and process for producing semiconductor device | FUJIFILM CORPORATION (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9568647-B2 | Optical film having antistatic layer, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20150252311-A1 | CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-9068153-B2 | Cleaning composition, cleaning process, and process for producing semiconductor device | FUJIFILM CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20140141235-A1 | OPTICAL FILM HAVING ANTISTATIC LAYER, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2014-05-22 | — | — | US | disclosed |
| US-8673182-B2 | Optical film having antistatic layer, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20110076852-A1 | CLEANING COMPOSITION, CLEANING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110049435-A1 | Optical film having antistatic layer, polarizing plate and image display device | FUJIFILM CORPORATION (JP) | 2011-03-03 | — | — | US | disclosed |
| EP-0602068-B1 | PROCESS FOR INCREASING POLYAMIDE MOLECULAR WEIGHT WITH ORGANOPHOSPHONIC ACID OR ESTER CATALYSTS IN THE PRESENCE OF ALUMINA-CONTAINING TiO 2? | DU PONT (US) | 1997-04-23 | — | — | EP | disclosed |
| EP-0602068-A1 | PROCESS FOR INCREASING POLYAMIDE MOLECULAR WEIGHT WITH ORGANOPHOSPHONIC ACID OR ESTER CATALYSTS IN THE PRESENCE OF ALUMINA-CONTAINING TiO 2?. | DU PONT (US) | 1994-06-22 | — | — | EP | disclosed |
| EP-0353969-B1 | Catalytic amidation process | DU PONT (US) | 1994-06-08 | — | — | EP | disclosed |
| WO-1993005086-A2 | PROCESS FOR INCREASING POLYAMIDE MOLECULAR WEIGHT WITH ORGANOPHOSPHONIC ACID OR ESTER CATALYSTS IN THE PRESENCE OF ALUMINA-CONTAINING TiO¿2? | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-18 | — | — | WO | disclosed |
| US-5142000-A | Process for increasing polyamide molecular weight with organophosphonic acid or ester catalysts in the presence of alumina-containing titanium dioxide | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-08-25 | — | — | US | disclosed |
| US-4912175-A | Heating | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-03-27 | — | — | US | disclosed |
| WO-1990001513-A1 | CATALYTIC AMIDATION PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-02-22 | — | — | WO | disclosed |
| EP-0353969-A1 | Catalytic amidation process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-02-07 | — | — | EP | disclosed |