SCHEMBL1479783

SCHEMBL1479783

CC([SiH](Cl)Cl)[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL301943 0.74
SCHEMBL467632 0.70
SCHEMBL2098658 0.67
SCHEMBL331409 0.67
SCHEMBL17688234 0.64 ALDH1A1 (0.31)
SCHEMBL8579050 0.63
SCHEMBL8052436 0.63 ALDH1A1 (0.56)
SCHEMBL9404499 0.61
SCHEMBL2268809 0.60
SCHEMBL10346404 0.60 ALDH1A1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10043990-B2 Dual-gate chemical field effect transistor sensor UNIVERSITY OF UTAH RESEARCH FOUNDATION (US) 2018-08-07 US claimed
US-20170110678-A1 DUAL-GATE CHEMICAL FIELD EFFECT TRANSISTOR SENSOR NATIONAL SCIENCE FOUNDATION 2017-04-20 US claimed
US-10043990-B2 Dual-gate chemical field effect transistor sensor UNIVERSITY OF UTAH RESEARCH FOUNDATION (US) 2018-08-07 US disclosed
US-20170110678-A1 DUAL-GATE CHEMICAL FIELD EFFECT TRANSISTOR SENSOR NATIONAL SCIENCE FOUNDATION 2017-04-20 US disclosed
US-8450515-B2 Production method for linear and cyclic trisilaalkane SAMSUNG FINE CHEMICALS CO., LTD (KR) 2013-05-28 US disclosed
CN-102498117-A Organic Chlorosilane And Method For Preparing Same SAMSUNG FINE CHEMICALS CO LTD 2012-06-13 CN disclosed
US-20120114544-A1 ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM SAMSUNG FINE CHEMICALS CO., LTD (KR) 2012-05-10 US disclosed
CN-102076700-A Production method for a linear or cyclic trisilaalkane SAMSUNG FINE CHEMICALS CO LTD 2011-05-25 CN disclosed
US-20110077420-A1 PRODUCTION METHOD FOR LINEAR AND CYCLIC TRISILAALKANE SAMSUNG FINE CHEMICALS CO., LTD. (KR) 2011-03-31 US disclosed
US-5332849-A From chloride and silane KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1994-07-26 US disclosed