SCHEMBL14805166

SCHEMBL14805166

CO[Si](C)(COc1ccc(S(=O)(=O)N=[N+]=[N-])cc1)OC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PKM P14618 5/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP3A4 P08684 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ MAPT P10636 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ F2 P00734 2/20 0.34
▸ PRSS1 P07477 2/20 0.34
▸ PRSS2 P07478 2/20 0.34
▸ PRSS3 P35030 2/20 0.34
▸ CA12 O43570 3/20 0.33
▸ CA1 P00915 3/20 0.33
▸ CA2 P00918 3/20 0.33
▸ CA7 P43166 3/20 0.33
▸ CA9 Q16790 3/20 0.33
▸ BCL2L1 Q07817 1/20 0.32
▸ BAK1 Q16611 1/20 0.32
▸ TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14805165 0.86 CA12 (0.38) PKMMAPTCA12CA1CA2
SCHEMBL14805167 0.84 CA12 (0.34) PKMCYP1A2CYP3A4CYP2D6MAPT
SCHEMBL14798242 0.80 CA1 (0.38) CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL14805176 0.79 CA12 (0.54) PKMCYP1A2MAPTCA12CA1
SCHEMBL14798582 0.78 TSHR (0.39) PKMCYP1A2CYP3A4CYP2D6MAPT
SCHEMBL1683275 0.77 F2 (0.54) PKMCYP1A2CYP3A4CYP2D6MAPT
SCHEMBL19874475 0.76 CA12 (0.44) CA12CA1CA2CA7CA9
SCHEMBL19874527 0.76 CA12 (0.44) CA12CA1CA2CA7CA9
SCHEMBL14805173 0.76 CA1 (0.35) PKMF2PRSS1PRSS2PRSS3
SCHEMBL14798078 0.76 CA1 (0.39) CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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