SCHEMBL14798078

SCHEMBL14798078

C[Si](C)(Cl)CCCOc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 7/20 0.39
▸ CA2 P00918 7/20 0.39
▸ CA9 Q16790 7/20 0.39
▸ CA12 O43570 6/20 0.39
▸ TSHR P16473 3/20 0.39
▸ CA7 P43166 2/20 0.39
▸ MAPK1 P28482 1/20 0.34
▸ RECQL P46063 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ MEN1 O00255 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ CA4 P22748 3/20 0.33
▸ MMP2 P08253 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798633 0.89 CA12 (0.38) CA1CA2CA9CA12TSHR
SCHEMBL14798634 0.87 CA12 (0.39) CA1CA2CA9CA12TSHR
SCHEMBL14798242 0.86 CA1 (0.38) CA1CA2CA9CA12TSHR
SCHEMBL14805167 0.85 CA12 (0.34) CA1CA2CA9CA12TSHR
SCHEMBL14798582 0.84 TSHR (0.39) CA1CA2CA9CA12TSHR
SCHEMBL14798639 0.84 CA12 (0.38) CA1CA2CA9CA12TSHR
SCHEMBL14798414 0.84 CA1 (0.40) CA1CA2CA9CA12TSHR
SCHEMBL19874527 0.83 CA12 (0.44) CA1CA2CA9CA12TSHR
SCHEMBL19874475 0.83 CA12 (0.44) CA1CA2CA9CA12TSHR
SCHEMBL14798412 0.83 TSHR (0.42) CA1CA2CA9CA12TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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