⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12573974 | 0.74 | — | — | |
| SCHEMBL5973088 | 0.74 | — | — | |
| SCHEMBL2452899 | 0.71 | — | — | |
| SCHEMBL16784420 | 0.69 | — | — | |
| SCHEMBL7521606 | 0.69 | — | — | |
| SCHEMBL18253674 | 0.69 | — | — | |
| SCHEMBL16192662 | 0.67 | — | — | |
| SCHEMBL572633 | 0.67 | — | — | |
| SCHEMBL389754 | 0.67 | — | — | |
| SCHEMBL303983 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104593747-B | Dielectric Barrier Deposition Using Oxygen-Containing Precursors | 弗萨姆材料美国有限责任公司 | 2019-05-28 | — | — | CN | claimed |
| CN-104593747-A | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PROD & CHEM | 2015-05-06 | — | — | CN | claimed |
| CN-102232125-B | Dielectric barrier deposition using oxygen-containing precursors | AIR PROD & CHEM | 2015-01-28 | — | — | CN | claimed |
| US-8637396-B2 | Dielectric barrier deposition using oxygen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-01-28 | — | — | US | claimed |
| EP-1992230-B1 | Use of an antibacterial agent | NANO X GMBH (DE) | 2013-07-03 | — | — | EP | claimed |
| EP-2429720-A2 | PHENOLATE ESTER COMPOUNDS | Nano-X GmbH (DE) | 2012-03-21 | — | — | EP | claimed |
| US-20120059116-A1 | METHOD OF PRODUCING PHENOLATE ESTER COMPOUNDS | NANO-X GMBH (DE) | 2012-03-08 | — | — | US | claimed |
| US-20120029143-A1 | SILANE COATING MATERIAL AND A PROCESS TO PRODUCE SILANE COATING | NANO-X GMBH (DE) | 2012-02-02 | — | — | US | claimed |
| EP-2383312-A1 | Silane coating material and method for manufacturing same | Nano-X GmbH (DE) | 2011-11-02 | — | — | EP | claimed |
| EP-2376672-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | Air Products and Chemicals, Inc. (US) | 2011-10-19 | — | — | EP | claimed |
| WO-2010130241-A2 | PHENOLATE ESTER COMPOUNDS | NANO-X GMBH (DE) | 2010-11-18 | — | — | WO | claimed |
| WO-2010065410-A1 | DIELECTRIC BARRIER DEPOSITION USING OXYGEN CONTAINING PRECURSOR | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-10 | — | — | WO | claimed |
| US-20100136789-A1 | Dielectric Barrier Deposition Using Oxygen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-03 | — | — | US | claimed |
| EP-1992230-A2 | Antibacterial agent | NANO-X GmbH (DE) | 2008-11-19 | — | — | EP | claimed |
| US-12448486-B2 | Formulation of CNT-containing siloxanes containing silicic acid | WACKER CHEMIE AG (DE) | 2025-10-21 | — | — | US | disclosed |
| CN-119320475-A | Modified carbon nine petroleum resin for toughening epoxy resin and preparation method thereof | 恒河材料科技股份有限公司 | 2025-01-17 | — | — | CN | disclosed |
| CN-118480270-A | Formulations containing CNT siloxanes containing silicic acid | 瓦克化学股份公司 | 2024-08-13 | — | — | CN | disclosed |
| US-5391797-A | Reacting alkoxysilane with polysiloxane in presence of aluminum alkoxide, zirconium alkoxide or zirconium chelate catalyst | KANEGAFUCHI CHEMICAL INDUSTRY CO., LTD. (JP) | 1995-02-21 | — | — | US | disclosed |
| EP-0618211-A1 | Process for preparing alkoxysilane | Kanegafuchi Chemical Industry Co., Ltd. (JP) | 1994-10-05 | — | — | EP | disclosed |
| EP-0484752-A1 | Photopolymerizable composition and photosensitive lithographic printing plate | Nippon Paint Co., Ltd. (JP) | 1992-05-13 | — | — | EP | disclosed |