SCHEMBL303983

SCHEMBL303983

C=C[SiH](C=C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL389754 0.69
SCHEMBL12302823 0.67
SCHEMBL148091 0.67
SCHEMBL7521606 0.65
SCHEMBL7857109 0.65
SCHEMBL17480221 0.65
Trimethylammonium SCHEMBL15015537 0.62
SCHEMBL15302236 0.62
SCHEMBL1585576 0.62
Propene SCHEMBL7938268 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250188615-A1 Gapfill Methods and Processing Assemblies ASM IP HOLDING B.V. (NL) 2025-06-12 US claimed
US-20240117494-A1 Gapfill methods and processing assemblies ASM IP HOLDING B.V. (NL) 2024-04-11 US claimed
CN-104710621-B Substrate bonding phenyl vinyl polysiloxane and its preparation method and application 深圳新宙邦科技股份有限公司 2018-04-17 CN claimed
CN-104710621-A Phenyl vinyl silicon resin for adhering base as well as preparation method and application thereof SHENZHEN CAPCHEM TECHNOLOGY CO LTD 2015-06-17 CN claimed
JP-55099976-A None JP disclosed
US-20250188615-A1 Gapfill Methods and Processing Assemblies ASM IP HOLDING B.V. (NL) 2025-06-12 US disclosed
CN-116829661-B Acrylic resin-modified silica particles, coating composition, and method for forming multilayer coating film 关西涂料株式会社 2025-03-18 CN disclosed
US-12252790-B2 Gapfill methods and processing assemblies ASM IP HOLDING B.V. (NL) 2025-03-18 US disclosed
CN-107922561-B Polyurethane resin particles 关西涂料株式会社 2024-07-12 CN disclosed
CN-118063768-A Near infrared siloxane-based quinoline polymer, preparation method thereof and application thereof in detection of copper ions 齐鲁理工学院 2024-05-24 CN disclosed
US-20240117494-A1 Gapfill methods and processing assemblies ASM IP HOLDING B.V. (NL) 2024-04-11 US disclosed
US-20240034890-A1 ACRYLIC RESIN-MODIFIED SILICA PARTICLES, COATING COMPOSITION AND METHOD FOR FORMING MULTILAYER COATING FILM KANSAI PAINT CO., LTD. (JP) 2024-02-01 US disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
US-5998561-A USING PLATIMUM, PALLADIUM COMPLEX CATALYST JENERIC/PENTRON INCORPORATED (US) 1999-12-07 US disclosed
WO-1998040043-A1 CATALYST AND COMPOSITION FOR SILICONE DENTAL IMPRESSION MATERIALS JENERIC/PENTRON INCORPORATED (US) 1998-09-17 WO disclosed
EP-0803483-A1 COMPOSITION FOR DOUBLE-GLAZING UNIT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1997-10-29 EP disclosed
EP-0279456-B1 Process for producing isobutylene polymers having functional terminal end groups KANEGAFUCHI CHEMICAL IND (JP) 1995-05-03 EP disclosed
US-4870144-A INITIATOR AND CHAIN TRANSFER AGENT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-09-26 US disclosed
EP-0279456-A2 Process for producing isobutylene polymers having functional terminal end groups KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-08-24 EP disclosed
JP-S5599976-A HYDROPHILIC TREATMENT OF METAL SURFACE KANSAI PAINT CO LTD 1980-07-30 JP disclosed