SCHEMBL14817261

SCHEMBL14817261

CCC(C)(C)CC(C(=O)OCC(=O)OCC(F)(F)C(F)(F)F)C(C)(C)CC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
FGFR1 P11362 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15160015 0.92
SCHEMBL13558163 0.90 FGFR1 (0.33) FGFR1
SCHEMBL16131627 0.90 FGFR1 (0.31) FGFR1
SCHEMBL14817262 0.89 HTT (0.35)
SCHEMBL14817689 0.87
SCHEMBL14817257 0.87
SCHEMBL14817687 0.86
SCHEMBL16638380 0.83 GAA (0.35)
SCHEMBL12649512 0.83
SCHEMBL13181068 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8742038-B2 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-06-03 US disclosed
US-8450044-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-28 US disclosed
US-8404426-B2 Negative resist composition, method of forming resist pattern and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-26 US disclosed
US-8404428-B2 Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-26 US disclosed