Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FGFR1 | P11362 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12649512 | 0.92 | — | — | |
| SCHEMBL14817261 | 0.90 | FGFR1 (0.32) | FGFR1 | |
| SCHEMBL14533302 | 0.90 | HTT (0.32) | — | |
| SCHEMBL14977988 | 0.89 | HTT (0.36) | — | |
| SCHEMBL16572700 | 0.87 | FGFR1 (0.32) | FGFR1 | |
| SCHEMBL14977981 | 0.86 | — | — | |
| SCHEMBL12235017 | 0.86 | — | — | |
| SCHEMBL12235947 | 0.85 | DGKA (0.30) | — | |
| SCHEMBL10330896 | 0.85 | FGFR1 (0.32) | FGFR1 | |
| SCHEMBL13180395 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8790868-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8475997-B2 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120328982-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120276481-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |