Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL28315203 | 1.00 | CA1 (0.62) | — | |
| Bicarbonate SCHEMBL29157215 | 0.94 | — | — | |
| Bicarbonate SCHEMBL28292801 | 0.94 | CA1 (0.56) | — | |
| Sulfur Dioxide SCHEMBL9456700 | 0.87 | — | — | |
| Bicarbonate SCHEMBL570721 | 0.79 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL1179 | 0.79 | — | — | |
| Bicarbonate SCHEMBL6478072 | 0.79 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL15271537 | 0.79 | — | — | |
| Bicarbonate SCHEMBL1250901 | 0.79 | CA1 (1.00) | — | |
| Bicarbonate SCHEMBL9672524 | 0.79 | CA1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1672097-A | Photosensitive anti-reflective bottom coating | BREWER SCIENCE INC (US) | 2005-09-21 | — | — | CN | claimed |
| EP-2070107-B1 | ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS | BREWER SCIENCE INC (US) | 2016-12-14 | — | — | EP | disclosed |
| CN-100999582-B | Photosensitive bottom anti-reflective coatings | BREWER SCIENCE INC | 2011-05-11 | — | — | CN | disclosed |
| US-7914974-B2 | Anti-reflective imaging layer for multiple patterning process | BREWER SCIENCE INC. (US) | 2011-03-29 | — | — | US | disclosed |
| CN-1672097-B | Photosensitive anti-reflective bottom coating | BREWER SCIENCE INC | 2010-05-12 | — | — | CN | disclosed |
| EP-2070107-A1 | ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS | Brewer Science, Inc. (US) | 2009-06-17 | — | — | EP | disclosed |
| WO-2009051920-A1 | RADIATION-SENSITIVE, WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND THEIR APPLICATIONS IN SEMICONDUCTOR MANUFACTURING | JSR MICRO, INC. (US) | 2009-04-23 | — | — | WO | disclosed |
| US-20090098490-A1 | Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing | JSR MICRO, INC. | 2009-04-16 | — | — | US | disclosed |
| US-20080044772-A1 | ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS | BREWER SCIENCE INC. | 2008-02-21 | — | — | US | disclosed |
| WO-2008022245-A1 | ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS | BREWER SCIENCE INC. (US) | 2008-02-21 | — | — | WO | disclosed |
| EP-1540417-A4 | PHOTOSENSITIVE BOTTOM ANTI-REFLECTIVE COATINGS | BREWER SCIENCE INC (US) | 2007-11-28 | — | — | EP | disclosed |
| CN-100999582-A | Photosensitive bottom anti-reflective coatings | BREWER SCIENCE INC (US) | 2007-07-18 | — | — | CN | disclosed |
| US-7108958-B2 | Photosensitive bottom anti-reflective coatings | BREWER SCIENCE INC. (US) | 2006-09-19 | — | — | US | disclosed |
| CN-1672097-A | Photosensitive anti-reflective bottom coating | BREWER SCIENCE INC (US) | 2005-09-21 | — | — | CN | disclosed |
| EP-1540417-A2 | PHOTOSENSITIVE BOTTOM ANTI-REFLECTIVE COATINGS | Brewer Science, Inc. (US) | 2005-06-15 | — | — | EP | disclosed |
| US-20040219456-A1 | Photosensitive bottom anti-reflective coatings | BREWER SCIENCE, INC. | 2004-11-04 | — | — | US | disclosed |
| WO-2004012239-A2 | PHOTOSENSITIVE BOTTOM ANTI-REFLECTIVE COATINGS | BREWER SCIENCE, INC. (US) | 2004-02-05 | — | — | WO | disclosed |
| US-4857604-A | TENSILE, TEAR, AND IMPACT STRENGTH, WEAR RESISTANT | GENERAL ELECTRIC COMPANY (US) | 1989-08-15 | — | — | US | disclosed |
| EP-0150454-A2 | Blends of elastomeric polyetherester copolymers with thermoplastic polycarbonates | GENERAL ELECTRIC COMPANY (US) | 1985-08-07 | — | — | EP | disclosed |