Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.49 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | TLR4 | O00206 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26105635 | 0.84 | GAA (0.54) | ALDH1A1GAARCE1PTGS1TLR4 | |
| SCHEMBL1483856 | 0.83 | GAA (0.49) | ALDH1A1GAARCE1PTGS1CYP1A2 | |
| SCHEMBL30309874 | 0.81 | GAA (0.54) | ALDH1A1GAARCE1PTGS1CYP1A2 | |
| SCHEMBL1270576 | 0.81 | GAA (0.54) | ALDH1A1GAARCE1PTGS1CYP1A2 | |
| SCHEMBL23322282 | 0.81 | ALDH1A1 (0.54) | ALDH1A1GAARCE1PTGS1CYP1A2 | |
| Ammonia Solution, Strong SCHEMBL27973467 | 0.80 | PTGS1 (0.56) | ALDH1A1PTGS1SMN1; SMN2ALOX5MAOB | |
| SCHEMBL28362166 | 0.80 | MAOB (0.59) | ALDH1A1GAAPTGS1CYP3A4SMN1; SMN2 | |
| SCHEMBL28359310 | 0.78 | ALDH1A1 (0.59) | ALDH1A1GAAPTGS1CYP3A4SMN1; SMN2 | |
| SCHEMBL1049509 | 0.78 | ALDH1A1 (0.75) | ALDH1A1GAARCE1PTGS1CYP1A2 | |
| SCHEMBL21612709 | 0.77 | GAA (0.68) | ALDH1A1GAARCE1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025063274-A1 | POLYIMIDE RESIN-CONTAINING COMPOSITION AND CURED PRODUCT THEREOF | 日本化薬株式会社 | 2025-03-27 | — | — | WO | disclosed |
| WO-2024202774-A1 | POLYIMIDE RESIN COMPOSITION AND CURED PRODUCT THEREOF | 日本化薬株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-8304149-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20110076458-A1 | PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTERNS, AND ELECTRONIC EQUIPMENT | NUNOMURA MASATAKA | 2011-03-31 | — | — | US | disclosed |
| US-7851128-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2010-12-14 | — | — | US | disclosed |
| EP-1376231-B1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEM DUPONT MICROSYS (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-20070072122-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | NUNOMURA MASATAKA | 2007-03-29 | — | — | US | disclosed |
| US-7150947-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2006-12-19 | — | — | US | disclosed |
| EP-0786928-B1 | Novel flexible copper-coated laminate and flexible printed circuit board | KANEGAFUCHI CHEMICAL IND (JP) | 2006-01-11 | — | — | EP | disclosed |
| US-20040029045-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2004-02-12 | — | — | US | disclosed |
| EP-1376231-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-0786928-A1 | Novel flexible copper-coated laminate and flexible printed circuit board | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-07-30 | — | — | EP | disclosed |
| US-5637382-A | Flexible copper-coated laminate and flexible printed circuit board | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-06-10 | — | — | US | disclosed |