SCHEMBL1483490

SCHEMBL1483490

[CH2]CCCC(O)CCCCC

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 2/20 0.52
FFAR4 Q5NUL3 1/20 0.52
NFKB1 P19838 1/20 0.50
GPR84 Q9NQS5 8/20 0.48
FDPS P14324 4/20 0.43
FAAH O00519 1/20 0.42
SPHK1 Q9NYA1 1/20 0.41
CA1 P00915 1/20 0.41
PSMD14 O00487 1/20 0.41
PLA2G1B P04054 1/20 0.41
HSP90AA1 P07900 1/20 0.41
MMP2 P08253 1/20 0.41
ATG4B Q9Y4P1 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17219666 0.98 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL349759 0.98 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL29268606 0.98 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL2760801 0.98 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL4882433 0.98 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL9008316 0.93 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL10382688 0.93 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL3919111 0.93 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL22400862 0.93 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS
SCHEMBL593055 0.93 FFAR1 (0.55) FFAR1FFAR4NFKB1GPR84FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3127927-B1 HEAT RESISTANT SAN RESIN, PREPARATION METHOD THEREFOR, AND HEAT RESISTANT SAN RESIN COMPOSITION CONTAINING SAME LG CHEMICAL LTD (KR) 2020-06-24 EP claimed
US-20060258829-A1 Urethane (meth)acrylate resin with acrylic backbone and ink compositions containing the same CYTEC SURFACE SPECIALTIES, S.A. (BE) 2006-11-16 US claimed
WO-2005028532-A1 URETHANE (METH)ACRYLATE RESIN WITH ACRYLIC BACKBONE AND INK COMPOSITIONS CONTAINING THE SAME CYTEC SURFACE SPECIALTIES, S.A. (BE) 2005-03-31 WO claimed
US-20050065310-A1 Urethane (meth)acrylate resin with acrylic backbone and ink compositions containing the same SURFACE SPECIALTIES, S.A. (BE) 2005-03-24 US claimed
US-20240228799-A1 NON-HAZARDOUS MONOMERS AS REACTIVE DILUENTS FOR RESINS ELANTAS EUROPE GMBH (DE) 2024-07-11 US disclosed
EP-4337634-A1 NON-HAZARDOUS MONOMERS AS REACTIVE DILUENTS FOR RESINS Elantas Europe GmbH (DE) 2024-03-20 EP disclosed
US-20220202683-A1 INCREASING THE STABILITY OF AGENTS FOR TREATING KERATIN MATERIAL HENKEL AG & CO. KGAA (DE) 2022-06-30 US disclosed
EP-3946241-A1 INCREASING THE STABILITY OF AGENTS FOR TREATING KERATIN MATERIAL Henkel AG & Co. KGaA (DE) 2022-02-09 EP disclosed
CN-113677317-A Increasing the stability of agents for treating keratin materials 汉高股份有限及两合公司 2021-11-19 CN disclosed
WO-2020200546-A1 INCREASING THE STABILITY OF AGENTS FOR TREATING KERATIN MATERIAL HENKEL AG & CO. KGAA (DE) 2020-10-08 WO disclosed
US-9803161-B2 Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-31 US disclosed
US-20150140820-A1 CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-21 US disclosed
EP-1172400-B1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY YUPO CORP (JP) 2005-12-28 EP disclosed
WO-2005068529-A1 ADHESIVES CYTEC SURFACE SPECIALTIES, S.A. (BE) 2005-07-28 WO disclosed
WO-2005028532-A1 URETHANE (METH)ACRYLATE RESIN WITH ACRYLIC BACKBONE AND INK COMPOSITIONS CONTAINING THE SAME CYTEC SURFACE SPECIALTIES, S.A. (BE) 2005-03-31 WO disclosed
US-20050065310-A1 Urethane (meth)acrylate resin with acrylic backbone and ink compositions containing the same SURFACE SPECIALTIES, S.A. (BE) 2005-03-24 US disclosed
US-6586106-B2 Ink transfer, adhesion and aging stability, and being satisfactory in back ghost when offset printing using oxidation polymerization type ink is performed on both faces YUPO CORPORATION (JP) 2003-07-01 US disclosed
US-20020054991-A1 Thermoplastic resin film satisfactory in printability YUPO CORPORATION (JP) 2002-05-09 US disclosed
EP-1172400-A1 THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY Yupo Corporation (JP) 2002-01-16 EP disclosed
EP-0450097-A1 BENZOHETEROCYCLIC COMPOUNDS. OTSUKA PHARMA CO LTD (JP) 1991-10-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220202683-A1 INCREASING THE STABILITY OF AGENTS FOR TREATING KERATIN MATERIAL KRT18, CCNO, AKR1B10 FFAR1 3516/4885FFAR4 4753/4885NFKB1 2310/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.