⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL96706 | 0.69 | TSHR (0.33) | — | |
| SCHEMBL263071 | 0.69 | — | — | |
| SCHEMBL15127451 | 0.67 | — | — | |
| SCHEMBL22210893 | 0.67 | — | — | |
| Methane SCHEMBL7075905 | 0.67 | — | — | |
| SCHEMBL6659883 | 0.67 | — | — | |
| SCHEMBL777472 | 0.67 | — | — | |
| SCHEMBL150610 | 0.64 | — | — | |
| SCHEMBL3423333 | 0.64 | — | — | |
| SCHEMBL6722007 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013047091-A1 | PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |