SCHEMBL6659883

SCHEMBL6659883

CC(C)C(C)(C)OO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL26107477 0.87 ALDH1A1 (0.37)
Hexane SCHEMBL27875071 0.83 SMN1; SMN2 (0.41)
SCHEMBL4432967 0.76
SCHEMBL10495920 0.74
SCHEMBL30229380 0.74
SCHEMBL96706 0.72 TSHR (0.33)
Tert-Butyl Hydroperoxide SCHEMBL10332512 0.72 ALDH1A1 (0.75)
SCHEMBL263071 0.72
SCHEMBL6179113 0.72 ALDH1A1 (0.32)
SCHEMBL8679580 0.72 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12215074-B2 Process for the production of peroxyesters NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2025-02-04 US disclosed
EP-3983380-B1 PROCESS FOR THE PRODUCTION OF PEROXYESTERS NOURYON CHEMICALS INT BV (NL) 2023-08-02 EP disclosed
US-20220235001-A1 PROCESS FOR THE PRODUCTION OF PEROXYESTERS NOURYON CHEMICALS INTERNATIONAL B.V. (NL) 2022-07-28 US disclosed
EP-3983380-A1 PROCESS FOR THE PRODUCTION OF PEROXYESTERS Nouryon Chemicals International B.V. (NL) 2022-04-20 EP disclosed
WO-2014104400-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-07-03 WO disclosed
WO-2013147286-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-10-03 WO disclosed
WO-2013039243-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-03-21 WO disclosed
US-20110255904-A1 LOW FRICTION ELECTROSTATOGRAPHIC IMAGING MEMBER XEROX CORPORATION (US) 2011-10-20 US disclosed
WO-2011108744-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-09-09 WO disclosed
EP-1220837-B1 PROCESS FOR PREPARING PEROXIDES USING MIXED ANHYDRIDES AKZO NOBEL NV (NL) 2004-08-18 EP disclosed
US-20040049070-A1 Reacting a hydroperoxide or acyl hydroperoxide with a mixed anhydride having a -C(O)-O-C(O)-O- group to form a peracid or diacyl peroxide; OVERKAMP JOHANNES WILLIBRORDUS (NL) 2004-03-11 US disclosed
US-6610880-B1 Reacting with an organohydroperoxide under basic conditions to form peracids, peresters, diacylperoxides or their hydroxy derivatives; low cost; odorless; high yield AKZO NOBEL NV (NL) 2003-08-26 US disclosed
EP-0908450-B1 Novel polyfunctional peroxides, vinyl monomer polymerization initiators comprising the same and process for polymerizing vinyl monomers employing the same NOF CORP (JP) 2003-05-07 EP disclosed
EP-1003900-B1 A PROCESS FOR THE PREPARATION OF A TERTIARY PERESTER AKZO NOBEL NV (NL) 2002-10-02 EP disclosed
US-6111042-A HIGH POLYMERIZATION INITIATION EFFICIENCY NOF CORPORATION (JP) 2000-08-29 US disclosed
US-5973181-A BIS(2,2-BIS(TERT-ALKYLPEROXYCARBONYLOXYMETHYL)ALKYL CARBONATE NOF CORPORATION (JP) 1999-10-26 US disclosed
EP-0908450-A2 Novel polyfunctional peroxides, vinyl monomer polymerization initiators comprising the same and process for polymerizing vinyl monomers employing the same NOF CORPORATION (JP) 1999-04-14 EP disclosed
EP-0332386-B1 Cyclic monoperoxyketal NIPPON OILS & FATS CO LTD (JP) 1994-06-08 EP disclosed
US-5004780-A Polymerization initiator of unsaturated monomers and during agent for unsaturated polyester resin NIPPON OIL AND FATS CO., LTD. (JP) 1991-04-02 US disclosed
EP-0332386-A2 Cyclic monoperoxyketal NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1989-09-13 EP disclosed