SCHEMBL14838422

SCHEMBL14838422

OC1CCC2CCCCC2O1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9806705 0.95
SCHEMBL7755588 0.90 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL12404661 0.75
SCHEMBL13677376 0.70 ALDH1A1 (0.33) ALDH1A1
SCHEMBL12976172 0.69 CYP2A6 (0.31)
SCHEMBL692856 0.67
SCHEMBL22484385 0.67 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL10689901 0.67 ALDH1A1 (0.35) ALDH1A1
SCHEMBL13676828 0.65
SCHEMBL14892035 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014042288-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-03-20 WO disclosed
WO-2013047091-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed