Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11923110 | 0.84 | ALDH1A1 (0.36) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL18431435 | 0.83 | ALDH1A1 (0.35) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL17545730 | 0.81 | KMT2A (0.35) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL14838353 | 0.81 | KMT2A (0.35) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL20215447 | 0.81 | KMT2A (0.33) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL2740754 | 0.80 | KMT2A (0.34) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL13527850 | 0.80 | ALDH1A1 (0.33) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL9608695 | 0.80 | ALDH1A1 (0.36) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL20215453 | 0.80 | ALDH1A1 (0.37) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 | |
| SCHEMBL1143209 | 0.79 | EPHX2 (0.33) | ALDH1A1LMNAKMT2AMEN1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013047091-A1 | PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |