SCHEMBL14838475

SCHEMBL14838475

CC(C)(C)CC([C@@H](N)O)C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13177839 0.75
SCHEMBL29824564 0.72 TRPV1 (0.31)
SCHEMBL30853001 0.72 TRPV1 (0.31)
SCHEMBL471215 0.72 LMNA (0.35) TSHR
SCHEMBL140066 0.71
SCHEMBL14040420 0.69 MAPK1 (0.30)
SCHEMBL22915108 0.67
SCHEMBL25596635 0.67
SCHEMBL24994972 0.65 DPP4 (0.33)
SCHEMBL13389339 0.65 TSHR (0.53) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047091-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed