SCHEMBL14838554

SCHEMBL14838554

CCC(=O)OC(C)(CC)C1CC2CCC1C2

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.39
CYP19A1 P11511 1/20 0.33
HSD11B1 P28845 1/20 0.33
ALDH1A1 P00352 2/20 0.32
NPC1 O15118 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
MAPK1 P28482 1/20 0.32
RAB9A P51151 1/20 0.32
GFER P55789 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
POLB P06746 1/20 0.32
GRM1 Q13255 1/20 0.31
SLC6A3 Q01959 1/20 0.31
PANK3 Q9H999 1/20 0.30
BRS3 P32247 1/20 0.30
SIRT5 Q9NXA8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8557137 0.86 EPHX2 (0.37) EPHX2CYP19A1HSD11B1ALDH1A1NPC1
SCHEMBL13527857 0.86 EPHX2 (0.36) EPHX2CYP19A1HSD11B1ALDH1A1
SCHEMBL6367094 0.85 EPHX2 (0.36) EPHX2CYP19A1HSD11B1ALDH1A1NPC1
SCHEMBL19497269 0.85 EPHX2 (0.36) EPHX2CYP19A1HSD11B1ALDH1A1NPC1
SCHEMBL120796 0.84 EPHX2 (0.40) EPHX2CYP19A1HSD11B1ALDH1A1NPC1
SCHEMBL9608690 0.82 EPHX2 (0.37) EPHX2HSD11B1ALDH1A1NPC1MAPT
SCHEMBL16807396 0.81 EPHX2 (0.34) EPHX2HSD11B1ALDH1A1NPC1MAPT
SCHEMBL20215446 0.81 EPHX2 (0.34) EPHX2HSD11B1ALDH1A1NPC1MAPT
SCHEMBL6366764 0.80 EPHX2 (0.36) EPHX2HSD11B1ALDH1A1NPC1HPGD
SCHEMBL19261101 0.79 EPHX2 (0.35) EPHX2ALDH1A1GRM1SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047091-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed