SCHEMBL14839366

SCHEMBL14839366

CC(C)c1ccc(C(=O)OC2(C)C3CC4CC(C3)CC2C4)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.43
CYP17A1 P05093 4/20 0.42
CYP19A1 P11511 4/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
PRSS1 P07477 1/20 0.41
ACR P10323 1/20 0.41
KDM4E B2RXH2 1/20 0.39
MAPT P10636 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.38
ALDH1A1 P00352 2/20 0.38
LMNA P02545 2/20 0.38
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
CYP2C9 P11712 1/20 0.37
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
CHRNB2 P17787 1/20 0.36
CHRNB4 P30926 1/20 0.36
CHRNA3 P32297 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13137712 0.86 CYP17A1 (0.42) CYP17A1CYP19A1MEN1KMT2AKDM4E
SCHEMBL15299104 0.85 CYP17A1 (0.41) POLBCYP17A1CYP19A1MEN1KMT2A
SCHEMBL24777432 0.82 CYP19A1 (0.41) CYP17A1CYP19A1KMT2AKDM4EMAPT
SCHEMBL16518847 0.82 CYP17A1 (0.44) POLBCYP17A1CYP19A1MEN1KMT2A
SCHEMBL6068257 0.81 CYP17A1 (0.49) CYP17A1CYP19A1MEN1KMT2ALMNA
SCHEMBL16518961 0.79 CYP17A1 (0.42) CYP17A1CYP19A1KMT2AMAPTSMN1; SMN2
SCHEMBL16426162 0.78 CYP17A1 (0.41) CYP17A1CYP19A1MEN1KMT2AMAPT
SCHEMBL10087719 0.78 CYP17A1 (0.41) POLBCYP17A1CYP19A1KMT2APRSS1
SCHEMBL16346925 0.78 CYP17A1 (0.41) CYP17A1CYP19A1KMT2AMAPTALDH1A1
SCHEMBL16426164 0.75 CYP17A1 (0.42) CYP17A1CYP19A1PRSS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047396-A1 PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed