SCHEMBL10087719

SCHEMBL10087719

CC1(OC(=O)c2ccc(S(=O)(=O)O)cc2)C2CC3CC(C2)CC1C3

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.41
CYP19A1 P11511 2/20 0.41
GLA P06280 1/20 0.37
RXRA P19793 1/20 0.36
RXRB P28702 1/20 0.36
RXRG P48443 1/20 0.36
PRSS1 P07477 3/20 0.36
ACR P10323 3/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
POLB P06746 1/20 0.35
ATM Q13315 1/20 0.34
MAPT P10636 2/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
CA14 Q9ULX7 1/20 0.34
PTPN2 P17706 1/20 0.34
PTPN1 P18031 1/20 0.34
PTPN6 P29350 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL178358 0.86 LCK (0.41) CYP17A1CYP19A1KMT2A
SCHEMBL27261419 0.84 ALDH1A1 (0.45) CYP17A1CYP19A1MAPTEPHX2KMT2A
SCHEMBL14543937 0.81 ATM (0.39) SMN1; SMN2POLBATMCA12CA1
SCHEMBL16518847 0.81 CYP17A1 (0.44) CYP17A1CYP19A1SMN1; SMN2POLBMAPT
SCHEMBL6068257 0.80 CYP17A1 (0.49) CYP17A1CYP19A1EPHX2MAPK1KMT2A
SCHEMBL23812255 0.79 HSP90AA1 (0.47) CYP17A1CYP19A1PRSS1ACRSMN1; SMN2
SCHEMBL16518961 0.78 CYP17A1 (0.42) CYP17A1CYP19A1SMN1; SMN2MAPTCA1
SCHEMBL14839366 0.78 POLB (0.43) CYP17A1CYP19A1PRSS1ACRSMN1; SMN2
SCHEMBL16346925 0.77 CYP17A1 (0.41) CYP17A1CYP19A1MAPTEPHX2HSP90AA1
SCHEMBL16426162 0.77 CYP17A1 (0.41) CYP17A1CYP19A1SMN1; SMN2MAPTEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-20120034564-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20120034564-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-8034537-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2011-10-11 US disclosed
US-20100112477-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-7635554-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
US-7635554-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2009-12-22 US disclosed
WO-2008123560-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-16 WO disclosed
US-20080248421-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080248421-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
EP-1975714-A1 Positive resist composition and pattern forming method FUJIFILM Corporation (JP) 2008-10-01 EP disclosed