SCHEMBL1484148

SCHEMBL1484148

O=C(F)C(F)(F)C(F)(F)S(=O)(=O)F

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TSHR P16473 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL761278 0.84
SCHEMBL4096617 0.80 TSHR (0.32) TSHRTDP1
SCHEMBL6138296 0.78 ALDH1A1 (0.42) ALDH1A1L3MBTL1TSHRTDP1
Fluoride SCHEMBL8763508 0.76 ALDH1A1 (0.40) ALDH1A1L3MBTL1
SCHEMBL29361625 0.76
SCHEMBL10886374 0.76
SCHEMBL2523834 0.75
SCHEMBL10888804 0.74
SCHEMBL10891405 0.74
SCHEMBL5164379 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5117055-A Method for direct conversion of fluorocarbonyl group into halogenides AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1992-05-26 US claimed
JP-58213749-A None JP disclosed
US-11292763-B2 Methods of making a polyfluorinated allyl ether and compounds relating to the methods 3M INNOVATIVE PROPERTIES COMPANY (US) 2022-04-05 US disclosed
US-8940471-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-01-27 US disclosed
US-8241795-B2 Electrolytic solutions and battery SONY CORPORATION (JP) 2012-08-14 US disclosed
US-8241795-B2 Electrolytic solutions and battery SONY CORPORATION (JP) 2012-08-14 US disclosed
US-20110076615-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed
CN-101197455-B Electrolyte solution and battery SONY CORP 2010-12-08 CN disclosed
US-7781612-B2 Process for producing fluorinated sulfonyl fluoride ASAHI GLASS COMPANY, LIMITED (JP) 2010-08-24 US disclosed
US-20080138714-A1 ELECTROLYTIC SOLUTIONS AND BATTERY SONY CORPORATION (JP) 2008-06-12 US disclosed
US-5117055-A Method for direct conversion of fluorocarbonyl group into halogenides AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1992-05-26 US disclosed
EP-0062430-B1 PROCESS FOR THE PREPARATION OF (OMEGA-FLUOROSULFONYL) HALOALIPHATIC CARBOXYLIC ACID FLUORIDES Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1986-11-12 EP disclosed
US-4613467-A FLUOROSULFONATED CARBOXYLIC ACID DERIVATIVE AS INTERMEDIATE FOR CATION EXCHANGE MEMBRANE COPOLYMER ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1986-09-23 US disclosed
US-4536352-A FOR CATION EXCHANGE MEMBRANES ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-08-20 US disclosed
US-4511518-A FLUORINATED VINYL ETHER MONOMERINTERMEDIATE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-04-16 US disclosed
US-4466881-A ELECROLYTIC FLUORINATION ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1984-08-21 US disclosed
US-4425199-A FLUORINATION, ELECTROLYSIS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1984-01-10 US disclosed
JP-S58213749-A NOVEL FLUORINATED CARBOXYLIC ACID DERIVATIVE AND PREPARATION THEREOF ASAHI CHEM IND CO LTD 1983-12-12 JP disclosed
EP-0062430-A1 Process for the preparation of (omega-fluorosulfonyl) haloaliphatic carboxylic acid fluorides Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1982-10-13 EP disclosed
US-4329435-A ION EXCHANGE RESINS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-05-11 US disclosed