SCHEMBL14849201

SCHEMBL14849201

CCC(C)(O[Si](C)(C)C(CC)(CC)O[SiH](C)C)[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15241855 0.83
SCHEMBL16984449 0.83
SCHEMBL15151260 0.81
SCHEMBL15580428 0.79
SCHEMBL16901603 0.75
SCHEMBL15028877 0.74
SCHEMBL16656614 0.74
SCHEMBL15028833 0.74
SCHEMBL15062043 0.73
SCHEMBL15095782 0.73 TSHR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2603535-B1 ELECTRICALLY INSULATING VARNISHES PREPARED FROM MODIFIED POLYMERS AND ELECTRICAL CONDUCTORS HAVING IMPROVED LUBRICITY PREPARED THEREFROM SCHWERING & HASSE ELEKTRODRAHT GMBH (DE) 2017-01-25 EP disclosed
US-8735264-B2 Temporary adhesive composition and method for manufacturing thin wafer using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-27 US disclosed
EP-2615124-A1 Organopolysiloxane, temporary adhesive composition containing organopolysiloxane, and method of producing thinned wafer using the same Shin-Etsu Chemical Co., Ltd. (JP) 2013-07-17 EP disclosed
EP-2602279-A1 Silicone-modified wax, composition and cosmetic preparation containing the same, and production method of silicone-modified wax Shin-Etsu Chemical Co., Ltd. (JP) 2013-06-12 EP disclosed
US-20130089967-A1 TEMPORARY ADHESIVE COMPOSITION AND METHOD FOR MANUFACTURING THIN WAFER USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-11 US disclosed