⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16656614 | 1.00 | — | — | |
| SCHEMBL15765700 | 0.84 | — | — | |
| SCHEMBL18911136 | 0.84 | — | — | |
| SCHEMBL15062043 | 0.81 | — | — | |
| SCHEMBL15028137 | 0.76 | — | — | |
| SCHEMBL15385074 | 0.74 | — | — | |
| SCHEMBL17029676 | 0.74 | — | — | |
| SCHEMBL15848892 | 0.74 | — | — | |
| SCHEMBL14849201 | 0.74 | — | — | |
| SCHEMBL18902680 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170110360-A1 | WAFER PROCESSING LAMINATE, TEMPORARY ADHESIVE MATERIAL FOR WAFER PROCESSING, AND METHOD FOR MANUFACTURING THIN WAFER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20160189996-A1 | WAFER PROCESSING LAMINATE, TEMPORARY ADHESIVE MATERIAL FOR WAFER PROCESSING, AND METHOD FOR MANUFACTURING THIN WAFER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| US-9235144-B2 | Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-8729148-B2 | Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-20 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |