⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1485852 | 1.00 | TSHR (0.36) | — | |
| SCHEMBL1485708 | 0.97 | — | — | |
| SCHEMBL24102699 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL23748166 | 0.88 | — | — | |
| SCHEMBL3626660 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL1949433 | 0.80 | — | — | |
| SCHEMBL10621331 | 0.77 | — | — | |
| SCHEMBL28860757 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL14748122 | 0.71 | — | — | |
| SCHEMBL24791704 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-209519237-U | A kind of functionalization implanted flexible electrode | 深圳先进技术研究院 | 2019-10-22 | — | — | CN | disclosed |
| CN-109350847-A | A kind of functionalization implanted flexible electrode and its application | 深圳先进技术研究院 | 2019-02-19 | — | — | CN | disclosed |
| CN-107033279-A | A kind of deformable stimuli responsive material and preparation method thereof and stimuli responsive flexible microelectrode arrays | 深圳先进技术研究院 | 2017-08-11 | — | — | CN | disclosed |
| CN-105074514-A | Polarizing plate | SUMITOMO CHEMICAL CO | 2015-11-18 | — | — | CN | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-6730757-B2 | CATALYST SYSTEMS COMPRISING A COMPLEX HAVING ONE OF THE FORMULAS LMX1X2 AND LML' AND AN ACTIVATING COCATALYST, AND USE OF THE CATALYST SYSTEM IN POLYMERIZING OLEFINIC MONOMERS. IN EITHER OF THE FOREGOING FORMULAS, L IS A CHELATING LIGAND | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY | 2004-05-04 | — | — | US | disclosed |
| US-20030171209-A1 | Sulfur-containing and sulfur-nitrogen-containing catalysts for polymerization of olefins and polar monomers | EXXONMOBIL CHEMICAL PATENTS INC. | 2003-09-11 | — | — | US | disclosed |
| EP-0764506-B1 | PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES | ARACO KK (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-6024895-A | COMPRISING SOLUBLE, ELECTRICALLY CONDUCTING POLYMER HAVING SULFONIC ACID GROUP AND/OR CARBOXYL GROUP AND THERMALLY CROSS-LINKABLE OR ULTRAVIOLET- OR ELECTRON BEAM-CROSS-LINKABLE RESIN OR PAINT | MITSUBISHI RAYON CO., LTD. (JP) | 2000-02-15 | — | — | US | disclosed |
| US-5961902-A | Manufacturing method for molded multilayer article | ARACO KABUSHIKI KAISHA (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0844284-A1 | CROSS-LINKABLE CONDUCTIVE COMPOSITION, CONDUCTOR, AND PROCESS FOR FORMING THE SAME | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-05-27 | — | — | EP | disclosed |
| EP-0837112-A2 | Cross-linkable, electrically conductive composition, electric conductor and process for forming the same | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-04-22 | — | — | EP | disclosed |
| EP-0764506-A1 | PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES | ARACO KABUSHIKI KAISHA (JP) | 1997-03-26 | — | — | EP | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |