Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.47 |
| ▸ | AGXT | P21549 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 4/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA7 | P43166 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | NAAA | Q02083 | 2/20 | 0.41 |
| ▸ | TACR1 | P25103 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13003073 | 0.89 | TSHR (0.54) | TSHRCA1CA2CA7CA9 | |
| SCHEMBL10052366 | 0.89 | TSHR (0.54) | TSHRCA1CA2CA7CA9 | |
| SCHEMBL2608877 | 0.84 | IDO1 (0.52) | IDO1AGXTTSHRCA1CA2 | |
| SCHEMBL14866839 | 0.80 | AGXT (0.45) | IDO1AGXTCA1CA2CA9 | |
| SCHEMBL19232139 | 0.80 | HPGD (0.43) | IDO1CA1CA2 | |
| SCHEMBL14453899 | 0.79 | TSHR (0.61) | TSHRCA1CA2CA7CA9 | |
| SCHEMBL13749320 | 0.79 | CYP3A4 (0.44) | IDO1 | |
| SCHEMBL6969891 | 0.79 | FOLH1 (0.53) | TSHR | |
| SCHEMBL2614813 | 0.77 | IDO1 (0.57) | IDO1AGXTTSHRNAAA | |
| SCHEMBL14866820 | 0.77 | TACR1 (0.51) | TACR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9034558-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20130115557-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130095429-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |