SCHEMBL14866959

SCHEMBL14866959

CCC(C)COCc1ccc(C(C)(C)C)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ APP P05067 1/20 0.42
▸ TP53 P04637 1/20 0.41
▸ TSHR P16473 1/20 0.41
▸ NR4A2 P43354 2/20 0.39
▸ RXRA P19793 1/20 0.39
▸ RXRB P28702 1/20 0.39
▸ RAB9A P51151 2/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ HTT P42858 2/20 0.38
▸ HPGD P15428 1/20 0.38
▸ TACR1 P25103 1/20 0.38
▸ LMNA P02545 1/20 0.36
▸ TYR P14679 1/20 0.36
▸ GRIA4 P48058 1/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ CHRM3 P20309 1/20 0.36
▸ L3MBTL1 Q9Y468 3/20 0.35
▸ NR4A1 P22736 1/20 0.35
▸ NR4A3 Q92570 1/20 0.35
▸ EBP Q15125 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10202405 0.85 APP (0.41) APPTP53TSHRNR4A2RXRA
SCHEMBL28001064 0.81 APP (0.44) APPTP53TSHRNR4A2RXRA
SCHEMBL14866839 0.80 AGXT (0.45) RAB9ANPC1HTTHPGDTACR1
SCHEMBL19232139 0.80 HPGD (0.43) TP53HTTHPGDLMNACHRM3
SCHEMBL4367676 0.79 APP (0.55) APPTP53TSHRNR4A2RXRA
SCHEMBL13749320 0.79 CYP3A4 (0.44) APPHTTHPGD
SCHEMBL13003073 0.78 TSHR (0.54) TSHRHTTTACR1KMT2AL3MBTL1
SCHEMBL10052366 0.78 TSHR (0.54) TSHRHTTTACR1KMT2AL3MBTL1
SCHEMBL8251933 0.77 APP (0.50) APPTP53TSHRNR4A2RXRA
SCHEMBL19827383 0.76 CYP3A4 (0.43) APPTSHRNR4A2RXRARXRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 — — US disclosed
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 — — US disclosed
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