SCHEMBL14867129

SCHEMBL14867129

CCC(C)(C)C(=O)OCC(=O)NC(=O)C1C2CC3C(=O)OC1C3C2

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.35
MEN1 O00255 1/20 0.34
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14925601 0.83 CCR2 (0.31)
SCHEMBL47522 0.78
SCHEMBL13039148 0.78
SCHEMBL9973376 0.77 HMGCR (0.33)
SCHEMBL17175437 0.76
SCHEMBL16605691 0.76
SCHEMBL13554507 0.76
SCHEMBL15247814 0.75
SCHEMBL15247758 0.75
SCHEMBL17929900 0.75 CCR2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130095427-A1 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-18 US disclosed