SCHEMBL14867142

SCHEMBL14867142

C=C(C)C(=O)OCC(=O)OC1C2CC3C1OS(=O)(=S)C3C2

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18785987 0.89 ALDH1A1 (0.33) ALDH1A1
SCHEMBL775673 0.89 ALDH1A1 (0.33) ALDH1A1
SCHEMBL12602337 0.80 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17339978 0.80
SCHEMBL14330860 0.79
SCHEMBL17247219 0.79 ALDH1A1 (0.33) ALDH1A1
SCHEMBL22788080 0.78 ALDH1A1 (0.35) ALDH1A1
SCHEMBL12602327 0.78 TSHR (0.33) ALDH1A1
SCHEMBL13060931 0.77
SCHEMBL7010226 0.76 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130095427-A1 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-18 US disclosed
US-20130095427-A1 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-04-18 US disclosed