Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | MAOA | P21397 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 6/20 | 0.47 |
| ▸ | CA1 | P00915 | 6/20 | 0.47 |
| ▸ | CA2 | P00918 | 5/20 | 0.47 |
| ▸ | CA9 | Q16790 | 5/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | DRD2 | P14416 | 3/20 | 0.41 |
| ▸ | STK17B | O94768 | 1/20 | 0.38 |
| ▸ | STK17A | Q9UEE5 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14877954 | 1.00 | CA14 (0.58) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL18950461 | 0.96 | CA14 (0.63) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL14877953 | 0.94 | CA14 (0.55) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL13055412 | 0.94 | CA14 (0.64) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL13004665 | 0.93 | CA14 (0.59) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL13055410 | 0.91 | CA14 (0.68) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL8021860 | 0.91 | CA14 (0.68) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL8719347 | 0.91 | CA14 (0.68) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL14439576 | 0.90 | CA14 (0.60) | CA14TDP1MAOAMAOBCA12 | |
| SCHEMBL25628397 | 0.90 | CA14 (0.63) | CA14TDP1MAOAMAOBCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8426105-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |