⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14917540 | 1.00 | — | — | |
| SCHEMBL14917531 | 1.00 | — | — | |
| SCHEMBL1079757 | 0.83 | — | — | |
| SCHEMBL4418989 | 0.78 | TDP1 (0.31) | — | |
| SCHEMBL22105 | 0.76 | — | — | |
| Methane SCHEMBL23927285 | 0.73 | — | — | |
| SCHEMBL9402771 | 0.73 | TSHR (0.36) | — | |
| Hydrochloric Acid SCHEMBL220991 | 0.73 | — | — | |
| Ammonia Solution, Strong SCHEMBL797498 | 0.73 | — | — | |
| SCHEMBL7851077 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230031720-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. (NL) | 2023-02-02 | — | — | US | disclosed |
| US-11075083-B2 | Si-passivated GE gate stack | IMEC VZW (BE) | 2021-07-27 | — | — | US | disclosed |
| US-20210025059-A1 | PLASMA ATOMIC LAYER DEPOSITION | ASM IP HOLDING B.V. (NL) | 2021-01-28 | — | — | US | disclosed |
| US-20200388487-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. (NL) | 2020-12-10 | — | — | US | disclosed |
| US-10822700-B2 | Plasma atomic layer deposition | ASM IP HOLDING B.V. (NL) | 2020-11-03 | — | — | US | disclosed |
| US-10784105-B2 | Methods for forming doped silicon oxide thin films | ASM INTERNATIONAL N.V. (NL) | 2020-09-22 | — | — | US | disclosed |
| US-20200208268-A1 | PLASMA ATOMIC LAYER DEPOSITION | ASM IP HOLDING B.V. (NL) | 2020-07-02 | — | — | US | disclosed |
| US-20200203168-A1 | Si-Passivated GE Gate Stack | IMEC VZW (BE) | 2020-06-25 | — | — | US | disclosed |
| EP-3671813-A1 | SI-PASSIVATED GE GATE STACK | IMEC vzw (BE) | 2020-06-24 | — | — | EP | disclosed |
| US-20200185218-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. (NL) | 2020-06-11 | — | — | US | disclosed |
| US-9564314-B2 | Methods for forming doped silicon oxide thin films | ASM INTERNATIONAL N.V. (NL) | 2017-02-07 | — | — | US | disclosed |
| US-20160196970-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. (NL) | 2016-07-07 | — | — | US | disclosed |
| US-9368352-B2 | Methods for forming doped silicon oxide thin films | ASM INTERNATIONAL N.V. (NL) | 2016-06-14 | — | — | US | disclosed |
| US-9330899-B2 | Method of depositing thin film | ASM IP HOLDING B.V. (NL) | 2016-05-03 | — | — | US | disclosed |
| US-9153441-B2 | Methods for forming doped silicon oxide thin films | ASM INTERNATIONAL, N.V. (NL) | 2015-10-06 | — | — | US | disclosed |
| US-20150279681-A1 | PLASMA ATOMIC LAYER DEPOSITION | ASM IP HOLDING B.V. (NL) | 2015-10-01 | — | — | US | disclosed |
| US-20150147875-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. (NL) | 2015-05-28 | — | — | US | disclosed |
| US-20140120738-A1 | METHOD OF DEPOSITING THIN FILM | ASM IP HOLDING B.V. (NL) | 2014-05-01 | — | — | US | disclosed |
| US-8679958-B2 | Methods for forming doped silicon oxide thin films | ASM INTERNATIONAL N.V. (NL) | 2014-03-25 | — | — | US | disclosed |
| US-20130115763-A1 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM International. N.V. (NL) | 2013-05-09 | — | — | US | disclosed |