Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RIPK1 | Q13546 | 9/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14962511 | 0.84 | RIPK1 (0.43) | RIPK1HTTL3MBTL1 | |
| SCHEMBL14962526 | 0.83 | TSHR (0.33) | TSHRSMN1; SMN2 | |
| SCHEMBL106867 | 0.82 | RIPK1 (0.37) | RIPK1TSHRSMN1; SMN2 | |
| SCHEMBL14962524 | 0.81 | RIPK1 (0.33) | RIPK1 | |
| SCHEMBL14962527 | 0.80 | RIPK1 (0.43) | RIPK1KDM4ELMNAMAPK1HTT | |
| SCHEMBL14867071 | 0.77 | TSHR (0.33) | RIPK1TSHRSMN1; SMN2CYP4F2CYP4A11 | |
| SCHEMBL14747379 | 0.75 | RIPK1 (0.33) | RIPK1KDM4ELMNAMAPK1HTT | |
| SCHEMBL14649752 | 0.74 | GAA (0.44) | LMNATSHRCYP4F2CYP4A11 | |
| SCHEMBL2607778 | 0.74 | TET2 (0.38) | LMNAL3MBTL1TSHRCYP4F2CYP4A11 | |
| SCHEMBL14962530 | 0.74 | RIPK1 (0.33) | RIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9034558-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20130115557-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-05-09 | — | — | US | disclosed |